Differential pumping apparatus and focused charged particle beam system
AssigneeV Technology Co., Ltd.
InventorsMichinobu Mizumura, Toshinari Arai, Takanori Matsumoto, Takuro Takeshita
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AssigneeV Technology Co., Ltd.
InventorsMichinobu Mizumura, Toshinari Arai, Takanori Matsumoto, Takuro Takeshita
Estimating the term…
A differential pumping apparatus for creating a high vacuum inside a processing space includes a displacement drive unit configured to move a substrate to be processed or a head, to adjust parallelism and distance between a surface to be processed and a surface of the head. Gap measurement devices are placed at three or more locations along the periphery of the surface of the head to provide distance information. A gap control unit is configured to control the displacement drive unit in response to the distance information between the surface to be processed and the surface adapted to face the surface to be processed, so that the surface to be processed and the surface adapted to face the surface to be processed are parallel.
A differential pumping apparatus, comprising:
A focused charged particle beam system, comprising:
Dependencies are inferred from the claim text.