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US 12,640,335 B2Granted
Focused ion beam system
AssigneeV Technology Co., Ltd.
InventorMichinobu Mizumura
Life of this patent
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Abstract
A focused ion beam system includes a beam emitter and an aperture. The beam emitter is equipped with a focused ion beam optical system which works to control an ion beam, as produced by an ion source, and emit the ion beam into an inner space. The aperture communicates with the inner space to permit the ion beam, as emitted from the beam emitter, to pass therethrough, thereby having a target substrate exposed to the ion beam. The inner space is evacuated in a vacuum. A movable sealing valve is provided which selectively opens or closes the aperture.
Claims8
A focused ion beam system comprising:
- a beam emitter which includes a focused ion beam optical system working to control an ion beam, as produced by an ion source, and emit the ion beam into an inner space;
- an aperture which communicates with the inner space to permit the ion beam, as emitted from the beam emitter, to pass therethrough, thereby having a target substrate exposed to the ion beam;
- and
- a secondary charged particle detector which is disposed in the inner space to capture a secondary charged particle, wherein
- the inner space is evacuated in a vacuum,
- a movable sealing valve is provided which selectively opens or closes the aperture, and
- the movable sealing valve has a portion which is irradiated with the ion beam when the aperture is closed and on which a fiducial alignment mark is arranged.
4 more elements
Dependencies are inferred from the claim text.