H01J 2237/028
Particle traps
H01J2237/028 (Particle traps) appears on 44 US grants and 47 published applications in this corpus.
Search patents in H01J- Granted patents
- 44
- Published applications
- 47
- Assignees
- 41
- Inventors
- 132
- Latest grant
- 26 Nov 2024
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1990 | 1 | 0 |
| 1991 | 0 | 0 |
| 1992 | 1 | 0 |
| 1993 | 0 | 0 |
| 1994 | 1 | 0 |
| 1995 | 1 | 0 |
| 1996 | 0 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 0 | 0 |
| 2000 | 0 | 0 |
| 2001 | 2 | 0 |
| 2002 | 1 | 1 |
| 2003 | 2 | 1 |
| 2004 | 0 | 0 |
| 2005 | 1 | 1 |
| 2006 | 0 | 3 |
| 2007 | 0 | 2 |
| 2008 | 1 | 5 |
| 2009 | 6 | 3 |
| 2010 | 2 | 0 |
| 2011 | 4 | 2 |
| 2012 | 0 | 2 |
| 2013 | 3 | 2 |
| 2014 | 1 | 2 |
| 2015 | 1 | 2 |
| 2016 | 2 | 5 |
| 2017 | 6 | 2 |
| 2018 | 0 | 4 |
| 2019 | 3 | 2 |
| 2020 | 2 | 0 |
| 2021 | 1 | 0 |
| 2022 | 0 | 1 |
| 2023 | 0 | 1 |
| 2024 | 2 | 3 |
| 2025 | 0 | 1 |
| 2026 | 0 | 2 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Beam pattern device having beam absorber structure26 Nov 2024US 12,154,756 B2IMS Nanofabrication GmbH
- Apparatus for and method of controlling an energy spread of a charged-particle beam23 Jan 2024US 11,881,374 B2ASML Netherlands B. V.
- Charged-particle beam apparatus, charged-particle beam writing apparatus, and charged-particle beam controlling method4 May 2021US 10,998,162 B2NuFlare Technology, Inc.
- Charged particle beam apparatus and control method thereof22 Sep 2020US 10,784,074 B2Hitachi High-Technologies Corporation
- Ion beam irradiation apparatus14 Jul 2020US 10,714,302 B2Nissin Ion Equipment Co., Ltd.
- Electron Microscope10 Sep 2026US 2026/0269174 A1Hitachi High-Tech Corporation
- Particle transfer apparatus and methods2 Apr 2026US 2026/0092358 A1ASML Netherlands B. V.
- Process and apparatus for radical enhanced vapor deposition23 Jan 2025US 2025/0029831 A1ASM IP Holding B. V.
- Magnetic rotation device for high vacuum applications such as ion and isotope production26 Dec 2024US 2024/0429019 A1SHINE Technologies, LLC
- Ion Milling Device11 Apr 2024US 2024/0120174 A1Hitachi High-Tech Corporation
Most cited
By later US patents
- Ion beam blanking apparatus and method27US 5,155,368 AMicrion Corporation · 1992
- Charged particle beam apparatus and method of controlling charged particle beam13US 6,414,323 B1Kabushiki Kaisha Toshiba · 2002
- Apparatus for gettering of particles during plasma processing11US 5,332,441 AInternational Business Machines Corporation · 1994
- Gettering of particles during plasma processing11US 5,433,258 AInternational Business Machines Corporation · 1995
- Device for mass selective determination of an ion9US 9,035,245 B2Carl Zeiss Microscopy GmbH · 2015