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US 2026/0092358 A1Published application
Particle transfer apparatus and methods
AssigneeASML Netherlands B.V.
InventorsArjan Johannes Anton BEUKMAN, Syam Parayil VENUGOPALAN, Duygu AKBULUT, Pieter Willem Herman DE JAGER
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Abstract
A particle transfer system, including: a particle trap apparatus configured to trap a plurality of particles; and a particle conveyance structure configured to convey the particles in parallel from the particle trap apparatus to a substrate. In an aspect, the particle transfer system is included in a patterning system for generating a pattern on a substrate.
Claims20
A patterning system for generating a pattern on a substrate, the system comprising:
- a particle trap apparatus configured to trap a plurality of particles in a spatial arrangement and comprising one or more lasers configured to illuminate the particles to form the traps;
- and
- a particle conveyance structure configured to convey the particles in the form of a pattern from the particle trap apparatus to the substrate, the particle trap apparatus comprising a plurality of traps, each trap configured to hold one or more particles.
A particle transfer system, comprising:
- a particle source configured to provide particles;
- a particle cooling apparatus configured to cool the particles;
- a particle trap apparatus configured to illuminate a plurality of spatial locations to locally trap single particles;
- and
- a particle conveyance apparatus configured to convey the charged particles to a substrate surface.
2 more elements
Dependencies are inferred from the claim text.