Charged-particle beam apparatus, charged-particle beam writing apparatus, and charged-particle beam controlling method
AssigneeNuFlare Technology, Inc.
InventorsNobuo Miyamoto, Munehiro Ogasawara
Life of this patent
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Abstract
A charged-particle beam apparatus is provided with a cathode to emit charged particle beams, an anode to propagate the charged particle beams emitted from the cathode in a sample surface direction, an aperture to propagate a charged particle beam passing through an opening at a predetermined position and of a predetermined shape, among the charged particle beams passing through the anode, in the sample surface direction, and a first electrode that is disposed between the anode and the aperture, and is set at a first electric potential of a polarity repelling a polarity of an ion generated due to collision of a charged particle beam.
Claims16
A charged-particle beam apparatus comprising:
- a cathode to emit charged particle beams;
- an anode to propagate the charged particle beams emitted from the cathode in a sample surface direction;
- an aperture to propagate a charged particle beam passing through an opening at a predetermined position and of a predetermined shape, among the charged particle beams passing through the anode, in the sample surface direction;
- and
- a first electrode that is disposed between the anode and the aperture, and is set at a first electric potential of a polarity repelling a polarity of an ion generated due to collision of a charged particle beam.
A charged-particle beam writing apparatus comprising:
- a cathode to emit charged particle beams;
- an anode to propagate the charged particle beams emitted from the cathode in a sample surface direction;
- an aperture to propagate a charged particle beam passing through an opening at a predetermined position and of a predetermined shape, among the charged particle beams passing through the anode, in the sample surface direction;
- a first electrode that is disposed between the anode and the aperture, and is set at a first electric potential of a polarity repelling a polarity of an ion generated due to collision of a charged particle beam;
- and
- a write controller to irradiate a charged particle beam having passed through the aperture onto a sample surface to perform writing.
Dependencies are inferred from the claim text.