G21K 1/062
Devices having a multilayer structure
Official title: {Devices having a multilayer structure}
G21K1/062 (Devices having a multilayer structure) appears on 537 US grants and 576 published applications in this corpus.
Search patents in G21K- Granted patents
- 537
- Published applications
- 576
- Assignees
- 166
- Inventors
- 1,009
- Latest grant
- 14 Jul 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1980 | 2 | 0 |
| 1981 | 1 | 0 |
| 1982 | 1 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 1 | 0 |
| 1986 | 0 | 0 |
| 1987 | 4 | 0 |
| 1988 | 3 | 0 |
| 1989 | 1 | 0 |
| 1990 | 2 | 0 |
| 1991 | 2 | 0 |
| 1992 | 5 | 0 |
| 1993 | 6 | 0 |
| 1994 | 5 | 0 |
| 1995 | 6 | 0 |
| 1996 | 5 | 0 |
| 1997 | 4 | 0 |
| 1998 | 6 | 0 |
| 1999 | 3 | 0 |
| 2000 | 5 | 0 |
| 2001 | 8 | 6 |
| 2002 | 11 | 8 |
| 2003 | 15 | 31 |
| 2004 | 18 | 25 |
| 2005 | 12 | 26 |
| 2006 | 16 | 28 |
| 2007 | 23 | 26 |
| 2008 | 20 | 19 |
| 2009 | 15 | 24 |
| 2010 | 22 | 21 |
| 2011 | 14 | 28 |
| 2012 | 20 | 28 |
| 2013 | 20 | 31 |
| 2014 | 13 | 31 |
| 2015 | 14 | 21 |
| 2016 | 28 | 36 |
| 2017 | 26 | 26 |
| 2018 | 31 | 24 |
| 2019 | 28 | 24 |
| 2020 | 27 | 24 |
| 2021 | 20 | 27 |
| 2022 | 25 | 26 |
| 2023 | 16 | 20 |
| 2024 | 13 | 6 |
| 2025 | 17 | 8 |
| 2026 | 3 | 2 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Soft x-ray optics with improved filtering14 Jul 2026US 12,680,968 B2KLA Corporation
- Extreme ultraviolet mask and method of manufacturing the same16 Jun 2026US 12,656,676 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Lithography system and methods2 Jun 2026US 12,645,150 B2Taiwan Semiconductor Manufacturing Company.Ltd
- EUV radiation source apparatus for lithography30 Dec 2025US 12,510,827 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Apparatus for reflecting an incident ray of electromagnetic radiation9 Dec 2025US 12,491,275 B212180235 Canada Ltd.
- Modulation of X-Ray Beam Intensity27 Aug 2026US 2026/0251980 A1LumArray, Inc.
- Euv radiation source apparatus for lithography19 Mar 2026US 2026/0079405 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Reflective photomask blank, reflective photomask and method for manufacturing reflective photomask blank18 Dec 2025US 2025/0383596 A1Shin-Etsu Chemical Co., Ltd.
- Reflective member for euv lithography23 Oct 2025US 2025/0328068 A1ASML Netherlands B. V.
- Substrate with multilayer reflective film, reflective mask blank, reflective mask, and method for manufacturing semiconductor device11 Sep 2025US 2025/0284189 A1Hoya Corporation
Most cited
By later US patents
- Apparatus and method for exposing a substrate to UV radiation using asymmetric reflectors473US 7,692,171 B22010
- Ultraviolet reflector with coolant gas holes and method413US 8,338,809 B2APPLIED Materials.Inc. · 2012
- Multi-layered mirror152US 6,441,963 B2Nikon Corporation · 2002
- High efficiency replicated x-ray optics and fabrication method112US 6,278,764 B1The Regents of the Unviersity of California · 2001
- Angle dispersive x-ray spectrometer103US 5,923,720 AMolecular Metrology, Inc. · 1999