Ultraviolet reflector with coolant gas holes and method

A substrate process chamber comprising:

• (a) a substrate support;
• and
• (b) an ultraviolet lamp module comprising:
• (i) an elongated ultraviolet lamp spaced apart from the substrate support, the ultraviolet lamp configured to transmit ultraviolet light toward the substrate support;
• and
• (ii) a primary reflector comprising:
• (1) a centrally positioned reflector comprising a longitudinal strip having a plurality of through holes therein and a curved reflective surface with a dichroic coating;
• and
• (2) first and second side reflectors that are positioned on either side of the centrally positioned reflector to form a parabolic-type surface with the centrally positioned reflector, the first and second side reflectors each having an arcuate reflective surface with the dichroic coating.

A method of treating a substrate with ultraviolet radiation, the method comprising:

• (a) providing a substrate in a process zone;
• (b) energizing an ultraviolet lamp to generate ultraviolet radiation;
• (c) supporting behind the ultraviolet lamp, a primary reflector comprising:
• (i) a centrally positioned reflector comprising a longitudinal strip having a plurality of through holes therein to direct a coolant gas toward the ultraviolet lamp, and a curved reflective surface with a dichroic coating;
• and
• (ii) first and second side reflectors that are positioned on either side of the centrally positioned reflector to form a parabolic-type surface with the centrally positioned reflector, the first and second side reflectors each having an arcuate reflective surface with the dichroic coating;
• and
• (d) directing a plurality of streams of coolant gas through the through holes in the curved reflective surface to cool the ultraviolet lamp.