Apparatus and method for exposing a substrate to UV radiation using asymmetric reflectors

A substrate processing tool comprising:

• a body defining a substrate processing region;
• a substrate support adapted to support a substrate within the substrate processing region;
• a first UV lamp spaced apart from the substrate support and configured to transmit UV radiation to a substrate positioned on the substrate support, the first UV lamp comprising a first UV radiation source and a first reflector partially surrounding the first UV radiation source, the first reflector having opposing inner and outer reflective panels, the inner reflective panel having a first reflective surface and the outer reflective panel having a second reflective surface that is asymmetric to the first reflective surface;
• and
• second UV lamp spaced apart from the substrate support and configured to transmit UV radiation to a substrate positioned on the substrate support, the second UV lamp comprising a second UV radiation source and a second reflector partially surrounding the second UV radiation source, the second reflector opposing inner and outer reflective panels, the inner reflective panel having a third reflective surface and the outer reflective panel having a fourth reflective surface that is asymmetric to the third reflective surface.

A substrate processing tool comprising:

• a body defining a substrate processing region;
• a substrate support adapted to support a substrate within the substrate processing region;
• a first UV lamp spaced apart from the substrate support and configured to transmit UV radiation to a substrate positioned on the substrate support, the first UV lamp comprising a first elongated UV radiation source and a first reflector partially surrounding the first elongated UV radiation source, the first reflector having opposing inner and outer reflective panels, the inner reflective panel having a first reflective surface and the outer reflective panel having a second reflective surface that is asymmetric to the first reflective surface;
• and
• a second UV lamp spaced apart from the substrate support and configured to transmit UV radiation to a substrate positioned on the substrate support, the second UV lamp comprising a second elongated UV radiation source and a second reflector partially surrounding the second elongated UV radiation source, the second reflector opposing inner and outer reflective panels, the inner reflective panel having a third reflective surface and the outer reflective panel having a fourth reflective surface that is asymmetric to the third reflective surface.

A substrate processing system comprising:

• a body defining first and second processing regions that are separate and adjacent to one another;
• a first substrate support adapted to support a first substrate within the first processing region and a second substrate support adapted to support a second substrate within the second processing region;
• a first UV lamp spaced apart from the substrate support and configured to transmit UV radiation to a substrate positioned on the substrate support, the first UV lamp comprising a first UV radiation source and a first reflector partially surrounding the first UV radiation source, the first reflector having opposing inner and outer reflective panels, the inner reflective panel having a first reflective surface and the outer reflective panel having a second reflective surface that is asymmetric to the first reflective surface;
• a second UV lamp spaced apart from the substrate support and configured to transmit UV radiation to a substrate positioned on the substrate support, the second UV lamp comprising a second UV radiation source and a second reflector partially surrounding the second UV radiation source, the second reflector opposing inner and outer reflective panels, the inner reflective panel having a third reflective surface and the outer reflective panel having a fourth reflective surface that is asymmetric to the third reflective surface;
• a third UV lamp spaced apart from the substrate support and configured to transmit UV radiation to a substrate positioned on the substrate support, the first UV lamp comprising a third UV radiation source and a third reflector partially surrounding the third UV radiation source, the third reflector having opposing inner and outer reflective panels, the inner reflective panel having a fifth reflective surface and the outer reflective panel having a sixth reflective surface that is asymmetric to the fifth reflective surface;
• and
• a fourth UV lamp spaced apart from the substrate support and configured to transmit UV radiation to a substrate positioned on the substrate support, the fourth UV lamp comprising a fourth UV radiation source and a fourth reflector partially surrounding the fourth UV radiation source, the fourth reflector opposing inner and outer reflective panels, the inner reflective panel having a seventh reflective surface and the outer reflective panel having an eighth reflective surface that is asymmetric to the seventh reflective surface.