G21K 1/06
Arrangements for handling particles or ionising radiation: using diffraction, refraction or reflection
Official title: using diffraction, refraction or reflection, e.g. monochromators (G21K1/10, G21K7/00 take precedence)
G21K1/06 (Arrangements for handling particles or ionising radiation: using diffraction, refraction or reflection) appears on 1,479 US grants and 1,416 published applications in this corpus.
Search patents in G21K- Granted patents
- 1,479
- Published applications
- 1,416
- Assignees
- 479
- Inventors
- 2,586
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 1 | 0 |
| 1977 | 1 | 0 |
| 1978 | 1 | 0 |
| 1979 | 3 | 0 |
| 1980 | 7 | 0 |
| 1981 | 1 | 0 |
| 1982 | 5 | 0 |
| 1983 | 3 | 0 |
| 1984 | 6 | 0 |
| 1985 | 5 | 0 |
| 1986 | 4 | 0 |
| 1987 | 6 | 0 |
| 1988 | 7 | 0 |
| 1989 | 6 | 0 |
| 1990 | 14 | 0 |
| 1991 | 13 | 0 |
| 1992 | 16 | 0 |
| 1993 | 21 | 0 |
| 1994 | 14 | 0 |
| 1995 | 12 | 0 |
| 1996 | 18 | 0 |
| 1997 | 17 | 0 |
| 1998 | 21 | 0 |
| 1999 | 24 | 0 |
| 2000 | 23 | 0 |
| 2001 | 33 | 11 |
| 2002 | 40 | 36 |
| 2003 | 32 | 50 |
| 2004 | 44 | 75 |
| 2005 | 37 | 60 |
| 2006 | 48 | 61 |
| 2007 | 54 | 55 |
| 2008 | 56 | 50 |
| 2009 | 40 | 45 |
| 2010 | 40 | 57 |
| 2011 | 33 | 66 |
| 2012 | 46 | 75 |
| 2013 | 50 | 87 |
| 2014 | 54 | 59 |
| 2015 | 56 | 81 |
| 2016 | 65 | 78 |
| 2017 | 73 | 68 |
| 2018 | 70 | 56 |
| 2019 | 69 | 59 |
| 2020 | 66 | 63 |
| 2021 | 52 | 52 |
| 2022 | 55 | 57 |
| 2023 | 33 | 48 |
| 2024 | 41 | 25 |
| 2025 | 30 | 27 |
| 2026 | 13 | 15 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Extreme ultraviolet light source device6 Oct 2026US 12,757,312 B2Samsung Electronics Co., Ltd.
- Structured wave generator and device for diffracting a neutron beam into a structured wave1 Sep 2026US 12,725,718 B2Incoherent Vision Inc.
- Soft x-ray optics with improved filtering14 Jul 2026US 12,680,968 B2KLA Corporation
- Systems and methods for assembling electron spin and charge to possess properties of a magnetic monopole30 Jun 2026US 12,671,007 B2The Trustees of Columbia University in the City of New York
- Extreme ultraviolet mask and method of manufacturing the same16 Jun 2026US 12,656,676 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Systems and methods for assembling electron spin and charge to possess properties of a magnetic monopole1 Oct 2026US 2026/0301988 A1University of Pittsburgh—Of the Commonwealth System of Higher Education
- Euv mirror with improved optical stability10 Sep 2026US 2026/0267232 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Modulation of X-Ray Beam Intensity27 Aug 2026US 2026/0251980 A1LumArray, Inc.
- High power and high precision x-ray spectroscope27 Aug 2026US 2026/0253760 A1Advanced Fusion Systems LLC
- X-ray focusing and wavelength selection13 Aug 2026US 2026/0237536 A1Nova Measuring Instruments Ltd.
Most cited
By later US patents
- Apparatus and method for exposing a substrate to UV radiation using asymmetric reflectors473US 7,692,171 B22010
- Ultraviolet reflector with coolant gas holes and method413US 8,338,809 B2APPLIED Materials.Inc. · 2012
- Systems and methods for reducing the influence of plasma-generated debris on the internal components of an EUV light source260US 7,196,342 B2Cymer, Inc. · 2007
- Multi-layered mirror152US 6,441,963 B2Nikon Corporation · 2002
- Maskless, microlens EUV lithography system148US 6,498,685 B12002