G21K 1/067
Using surface reflection
Official title: {using surface reflection, e.g. grazing incidence mirrors, gratings (multilayer mirrors G21K1/062)}
G21K1/067 (Using surface reflection) appears on 206 US grants and 258 published applications in this corpus.
Search patents in G21K- Granted patents
- 206
- Published applications
- 258
- Assignees
- 116
- Inventors
- 520
- Latest grant
- 2 Jun 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1999 | 1 | 0 |
| 2000 | 0 | 0 |
| 2001 | 0 | 0 |
| 2002 | 1 | 0 |
| 2003 | 0 | 0 |
| 2004 | 0 | 1 |
| 2005 | 0 | 1 |
| 2006 | 0 | 1 |
| 2007 | 1 | 1 |
| 2008 | 2 | 1 |
| 2009 | 1 | 0 |
| 2010 | 2 | 6 |
| 2011 | 1 | 11 |
| 2012 | 9 | 15 |
| 2013 | 8 | 30 |
| 2014 | 15 | 12 |
| 2015 | 13 | 34 |
| 2016 | 20 | 24 |
| 2017 | 22 | 26 |
| 2018 | 23 | 19 |
| 2019 | 22 | 15 |
| 2020 | 18 | 11 |
| 2021 | 14 | 16 |
| 2022 | 9 | 5 |
| 2023 | 3 | 8 |
| 2024 | 15 | 8 |
| 2025 | 3 | 4 |
| 2026 | 3 | 9 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- X-ray irradiation apparatus, including a spectrally shaping X-ray optic and a spectral filter aperture device, for X-ray imaging2 Jun 2026US 12,646,634 B2Universitaet Hamburg
- EUV mirror with improved optical stability26 May 2026US 12,638,778 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Three-dimensional printed structure with double wall elements28 Apr 2026US 12,611,710 B2Koninklijke Philips N. V.
- EUV collector14 Oct 2025US 12,443,109 B2Carl Zeiss SMT GmbH
- Optical component10 Jun 2025US 12,326,663 B2Carl Zeiss SMT GmbH
- Euv mirror with improved optical stability10 Sep 2026US 2026/0267232 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Modulation of X-Ray Beam Intensity27 Aug 2026US 2026/0251980 A1LumArray, Inc.
- High power and high precision x-ray spectroscope27 Aug 2026US 2026/0253760 A1Advanced Fusion Systems LLC
- X-ray focusing and wavelength selection13 Aug 2026US 2026/0237536 A1Nova Measuring Instruments Ltd.
- Radiation beam scanning optical system and inspection apparatus6 Aug 2026US 2026/0227348 A1Hamamatsu Photonics K.K.
Most cited
By later US patents
- Illumination system particularly for microlithography79US 6,438,199 B1Carl-Zeiss-Stiftung · 2002
- Differential phase contrast X-ray imaging system and components46US 8,767,915 B2The Johns Hopkins University · 2014
- X-ray transmission spectrometer system39US 10,295,485 B2Sigray, Inc. · 2019
- Differential phase-contrast imaging35US 10,028,716 B2Koniklijke Philips N. V. · 2018
- Differential phase-contrast imaging35US 9,861,330 B2Koninklijke Philips N. V. · 2018