G03F 7/0384
With ethylenic or acetylenic bands in the main chain of the photopolymer
Official title: {with ethylenic or acetylenic bands in the main chain of the photopolymer}
G03F7/0384 (With ethylenic or acetylenic bands in the main chain of the photopolymer) appears on 93 US grants and 98 published applications in this corpus.
Search patents in G03F- Granted patents
- 93
- Published applications
- 98
- Assignees
- 82
- Inventors
- 372
- Latest grant
- 11 Nov 2025
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1977 | 1 | 0 |
| 1978 | 1 | 0 |
| 1979 | 0 | 0 |
| 1980 | 1 | 0 |
| 1981 | 4 | 0 |
| 1982 | 4 | 0 |
| 1983 | 1 | 0 |
| 1984 | 1 | 0 |
| 1985 | 1 | 0 |
| 1986 | 2 | 0 |
| 1987 | 3 | 0 |
| 1988 | 1 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 3 | 0 |
| 1992 | 1 | 0 |
| 1993 | 0 | 0 |
| 1994 | 1 | 0 |
| 1995 | 0 | 0 |
| 1996 | 1 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 0 | 0 |
| 2000 | 0 | 0 |
| 2001 | 2 | 1 |
| 2002 | 1 | 4 |
| 2003 | 3 | 4 |
| 2004 | 4 | 3 |
| 2005 | 1 | 0 |
| 2006 | 1 | 0 |
| 2007 | 2 | 1 |
| 2008 | 0 | 1 |
| 2009 | 0 | 1 |
| 2010 | 1 | 0 |
| 2011 | 1 | 2 |
| 2012 | 0 | 2 |
| 2013 | 1 | 3 |
| 2014 | 6 | 9 |
| 2015 | 7 | 18 |
| 2016 | 12 | 5 |
| 2017 | 8 | 3 |
| 2018 | 1 | 8 |
| 2019 | 5 | 3 |
| 2020 | 3 | 3 |
| 2021 | 2 | 1 |
| 2022 | 3 | 2 |
| 2023 | 0 | 3 |
| 2024 | 1 | 4 |
| 2025 | 2 | 11 |
| 2026 | 0 | 6 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Photoresist compositions and methods of fabricating a semiconductor device11 Nov 2025US 12,468,226 B2Samsung Electronics Co., Ltd.
- Photosensitive resin composition for flexographic printing17 Jun 2025US 12,332,564 B2Nippon Soda Co., Ltd.
- Photosensitive composition, negative photosensitive composition, pixel division layer and organic EL display device26 Mar 2024US 11,940,729 B2Toray Industries, Inc.
- Monomers, polymers and photoresist compositions1 Nov 2022US 11,487,203 B2Rohm and Haas Electronic Materials Korea Ltd.
- Pattern formation material and pattern formation method5 Jul 2022US 11,378,885 B2Kioxia Corporation
- Preparation of polymer, preparation of chemically amplified resist composition, resist pattern forming process, polymer, and chemically amplified resist composition3 Sep 2026US 2026/0259497 A1Shin-Etsu Chemical Co., Ltd.
- Negative photosensitive resin composition, dry film, cured product, and electronic component13 Aug 2026US 2026/0235951 A1Taiyo Holdings Co., Ltd.
- Phosphorus-based film compositions and patterning methods30 Jul 2026US 2026/0219574 A1Tokyo Electron Limited
- Compound for photolithographic medium composition, polymer, and photolithographic medium composition30 Apr 2026US 2026/0118761 A1Tan Kah Kee Innovation Laboratory
- Polymer for photolithographic medium composition, and photolithographic medium composition30 Apr 2026US 2026/0118762 A1Tan Kah Kee Innovation Laboratory
Most cited
By later US patents
- Lithographic plates and production process therefor62US 4,693,958 ALehigh University · 1987
- Photosensitive cross-linkable azide containing polymeric composition37US 4,106,943 AJapan Synthetic Rubber Co., Ltd. · 1978
- Photochemical method for manufacturing nanometrically surface-decorated substrates36US 7,655,383 B2DWI an der RWTH · 2010
- Photocurable polyurethane-acrylate ionomer compositions for aqueous developable printing plates29US 5,290,663 AW. R. Grace & Co.-Conn. · 1994
- Organometallic monoacylarylphosphines23US 6,399,805 B2Ciba Specialty Chemicals Corporation · 2002