Pattern formation material and pattern formation method

A pattern formation method, comprising:

• a film formation process of forming, on a substrate, a pattern formation material film including a pattern formation material;
• an absorption process of causing the pattern formation material film to absorb an organometal compound including a metallic element comprising at least one selected from the group consisting Al, Ti, V and W, the absorption processing being performed after the film formation process;
• and
• a patterning process of patterning the pattern formation material,
• the pattern formation material including a first monomer, the first monomer including a first molecular chain, a first group, and a second group, the first molecular chain including a first end and a second end, the first group having an ester bond to the first end, the second group having an ester bond to the second end, the first group being one of acrylic acid or methacrylic acid, the second group being one of acrylic acid or methacrylic acid,
• the first molecular chain including a plurality of first elements bonded in a straight chain configuration, the first elements being one of carbon or oxygen, the number of the first elements being 6 or more.