US 2026/0118762 A1 · POLYMER FOR PHOTOLITHOGRAPHIC MEDIUM COMPOSITION, AND PHOTOLITHOGRAPHIC MEDIUM COMPOSITION

Abstract

The present disclosure relates to a polymer for a photolithographic medium composition, and the photolithographic medium composition. The polymer has a structural unit represented by general formula (1) below. The polymer of the present disclosure maintains a carbon-rich structure (i.e., a polybenzene ring structure) while a sec-hydroxyl structure is introduced into the structure. The sec-hydroxyl structure can provide cross-linking sites during the film formation process of the material, which can improve the overall cross-linking density of the material, and consequently improve the etching resistance of the material. In addition, the sec-hydroxyl structure can serve as polar interaction sites, and has a strong movement ability, contributing to the improvement of the ability to interact with solvents. Thus, the solubility performance of the material is improved. The polymer of the present disclosure has excellent performance in the solubility and etching resistance, and the solubility of the polymer is improved while the etching resistance is considered. Thus, the polymer is very suitable as the material for an etching-resistant medium layer.

Claims41

Dependent claims

(canceled)

A polymer for a photolithographic medium composition, having a structural unit represented by general formula (2) below

wherein R2 is hydroxyl;
Z is selected from the group consisting of a single bond, a C1-C10 alkylene substituted by 0 to 3 RA, a C6-C20 arylene substituted by 0 to 3 RA, a C6-C20 aralkylene substituted by 0 to 3 RA, a C4-C20 heteroaralkylene substituted by 0 to 3 RA, and a C1-C10 heteroalkylene substituted by 0 to 3 RA;
R1 is selected from the group consisting of a C1-C10 alkyl substituted by 0 to 3 RA, a C6-C20 aryl substituted by 0 to 3 RA, a heteroaryl containing 3 to 20 skeletal ring-forming atoms and containing one or more identical or different heteroatoms substituted by 0 to 3 RA, a heterocyclyl containing 3 to 20 skeletal ring-forming atoms and containing one or more identical or different heteroatoms substituted by 0 to 3 RA, and a cyclic hydrocarbon group containing 3 to 20 carbon atoms substituted by 0 to 3 RA;
RA is each independently selected from the group consisting of hydrogen, halogen, cyano, a C1-C8 alkyl, a C2-C8 alkenyl, a C2-C8 alkynyl, —OR11, —SR11, —NR11R12, an ether group, and an ester group;
R11 and R12 are each independently selected from the group consisting of hydrogen, a C1-C8 alkyl, a C2-C8 alkenyl, and a C2-C8 alkynyl;
and
n is 2;
wherein the weight average molecular weight of the polymer is 500 to 20000 Da;
and the molecular weight distribution of the polymer is 1.1 to 4.0.

6 more elements

Dependencies are inferred from the claim text.

Polymer for photolithographic medium composition, and photolithographic medium composition

Life of this patent

Polymer for photolithographic medium composition, and photolithographic medium composition

Life of this patent

Abstract

Claims41