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US 2026/0219574 A1Published application
Phosphorus-based film compositions and patterning methods
AssigneeTokyo Electron Limited
InventorsAndrew Whittaker, Idriss Blakey, Hui Peng, Josua Markus, Md Daloar Hossain, Charlotte Cutler, David Conklin
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Abstract
A photoresist formulation for coating substrates includes a monomer and an organic solvent. The monomer includes an olefin and a phosphate ester.
Claims20
A photoresist formulation for coating substrates, the photoresist formulation comprising:
- a monomer comprising an olefin and a phosphate ester;
- and
- an organic solvent.
A photoresist formulation for coating substrates, the photoresist formulation comprising:
- a polymer comprising a phosphate ester;
- and
- an acid generator, the polymer and the acid generator being soluble in an organic solvent.
A method of patterning a substrate, the method comprising:
- forming a polymer coating over a substrate by a spin-on process, the polymer coating comprising phosphorus;
- exposing the substrate to an actinic radiation through a photomask to form an exposed region and a masked region of the polymer coating, wherein the actinic radiation comprises ultraviolet (UV) radiation;
- performing a first baking process on the substrate to convert the exposed region of the polymer coating into a crosslinked region of the polymer coating;
- rinsing the substrate with a solvent to remove portions of the masked region of the polymer coating, the removing forming a wet-developed region of the polymer coating;
- loading the substrate into a plasma processing chamber;
- and
- exposing the substrate to a plasma to remove the wet-developed region of the polymer coating.
4 more elements
Dependencies are inferred from the claim text.