G03F 1/20
Masks or mask blanks for imaging by charged particle beam [cpb] radiation
Official title: Masks or mask blanks for imaging by charged particle beam [CPB] radiation, e.g. by electron beam; Preparation thereof
G03F1/20 (Masks or mask blanks for imaging by charged particle beam [cpb] radiation) appears on 458 US grants and 352 published applications in this corpus.
Search patents in G03F- Granted patents
- 458
- Published applications
- 352
- Assignees
- 173
- Inventors
- 712
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1977 | 3 | 0 |
| 1978 | 4 | 0 |
| 1979 | 2 | 0 |
| 1980 | 1 | 0 |
| 1981 | 3 | 0 |
| 1982 | 2 | 0 |
| 1983 | 4 | 0 |
| 1984 | 2 | 0 |
| 1985 | 0 | 0 |
| 1986 | 4 | 0 |
| 1987 | 0 | 0 |
| 1988 | 2 | 0 |
| 1989 | 4 | 0 |
| 1990 | 6 | 0 |
| 1991 | 1 | 0 |
| 1992 | 2 | 0 |
| 1993 | 5 | 0 |
| 1994 | 9 | 0 |
| 1995 | 3 | 0 |
| 1996 | 9 | 0 |
| 1997 | 5 | 0 |
| 1998 | 12 | 0 |
| 1999 | 26 | 0 |
| 2000 | 19 | 0 |
| 2001 | 25 | 9 |
| 2002 | 38 | 38 |
| 2003 | 26 | 29 |
| 2004 | 21 | 39 |
| 2005 | 22 | 27 |
| 2006 | 19 | 28 |
| 2007 | 15 | 15 |
| 2008 | 15 | 10 |
| 2009 | 11 | 5 |
| 2010 | 11 | 12 |
| 2011 | 9 | 13 |
| 2012 | 8 | 11 |
| 2013 | 14 | 13 |
| 2014 | 16 | 20 |
| 2015 | 14 | 12 |
| 2016 | 13 | 11 |
| 2017 | 8 | 17 |
| 2018 | 13 | 10 |
| 2019 | 6 | 5 |
| 2020 | 7 | 3 |
| 2021 | 5 | 4 |
| 2022 | 2 | 5 |
| 2023 | 5 | 4 |
| 2024 | 1 | 5 |
| 2025 | 2 | 3 |
| 2026 | 4 | 4 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Method for electron beam-induced processing of a defect of a microlithographic photomask6 Oct 2026US 12,754,470 B2Carl Zeiss SMT GmbH
- Structured film and method of using same to form a pattern on a substrate12 May 2026US 12,625,423 B23M Innovative Properties Company
- Process for creating a three-dimensional structure in a lithography material via a laser lithography device12 May 2026US 12,625,426 B2Nanoscribe Holding GmbH
- Method verifying process proximity correction using machine learning, and semiconductor manufacturing method using same31 Mar 2026US 12,591,728 B2Samsung Electronics Co., Ltd.
- Method and system for applying a pattern on a mask layer19 Aug 2025US 12,391,034 B2Xsys Prepress NV
- Method and system for generation of lithography patterns27 Aug 2026US 2026/0251966 A1Vestlandets Innovasjonsselskap AS
- Structured Film and Method of Using Same to Form a Pattern on a Substrate27 Aug 2026US 2026/0251967 A13M Innovative Properties Company
- Grating structure capable of generating space-time vortex light and preparation method thereof18 Jun 2026US 2026/0169204 A1Anhui University
- Determining potential defects in mask patterns2 Apr 2026US 2026/0093182 A1GDM Holding LLC
- Stencil mask and use thereof in lithography fabrication4 Dec 2025US 2025/0369088 A1University of Copenhagen
Most cited
By later US patents
- Polysilicon thin film process151US 4,897,360 AWisconsin Alumni Research Foundation · 1990
- Structure with a silicon body having through openings88US 4,393,127 AInternational Business Machines Corporation · 1983
- Devices and methods for improved reflective electron beam lithography82US 8,722,286 B2Taiwan Semiconductor Manufacturing Company.Ltd · 2014
- Device manufacture involving step-and-scan delineation79US 5,260,151 AAT&T Bell Laboratories · 1993
- Electron beam drawing mask blank, electron beam drawing mask, and method of manufacturing the same63US 6,812,473 B1Hoya Corporation · 2004