G01N 2021/8438
Mutilayers
Official title: {Mutilayers}
G01N2021/8438 (Mutilayers) appears on 132 US grants and 154 published applications in this corpus.
Search patents in G01N- Granted patents
- 132
- Published applications
- 154
- Assignees
- 121
- Inventors
- 421
- Latest grant
- 14 Apr 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1987 | 2 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 1 | 0 |
| 1993 | 0 | 0 |
| 1994 | 0 | 0 |
| 1995 | 1 | 0 |
| 1996 | 0 | 0 |
| 1997 | 1 | 0 |
| 1998 | 0 | 0 |
| 1999 | 0 | 0 |
| 2000 | 1 | 0 |
| 2001 | 0 | 0 |
| 2002 | 0 | 0 |
| 2003 | 0 | 0 |
| 2004 | 1 | 0 |
| 2005 | 0 | 0 |
| 2006 | 2 | 1 |
| 2007 | 0 | 1 |
| 2008 | 2 | 2 |
| 2009 | 0 | 2 |
| 2010 | 3 | 2 |
| 2011 | 1 | 3 |
| 2012 | 3 | 7 |
| 2013 | 4 | 4 |
| 2014 | 6 | 7 |
| 2015 | 5 | 6 |
| 2016 | 9 | 12 |
| 2017 | 5 | 6 |
| 2018 | 5 | 13 |
| 2019 | 13 | 14 |
| 2020 | 9 | 11 |
| 2021 | 11 | 15 |
| 2022 | 7 | 18 |
| 2023 | 11 | 11 |
| 2024 | 13 | 9 |
| 2025 | 13 | 7 |
| 2026 | 3 | 3 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Field-biased nonlinear optical metrology using corona discharge source14 Apr 2026US 12,601,778 B2FemtoMetrix, Inc.
- Systems and methods for concurrent measurements of interferometric and ellipsometric signals of multi-layer thin films24 Mar 2026US 12,584,852 B2Nanoverse Technologies Ltd
- Method and device for determining at least one property of at least one layer using terahertz radiation27 Jan 2026US 12,535,411 B2Helmut Fischer GmbH Institut Fuer Elektronik Und Messtechnik
- Measurement of thick films and high aspect ratio structures4 Nov 2025US 12,461,041 B2KLA Corporation
- Terahertz wave detection chip and terahertz wave detection system12 Aug 2025US 12,385,832 B2Industrial Technology Research Institute
- Functional layer inspection method and functional layer inspection device10 Sep 2026US 2026/0266712 A1Samsung Display Co., Ltd.
- Systems and methods for concurrent measurements of interferometric and ellipsometric signals of multi-layer thin films30 Jul 2026US 2026/0219168 A1Nanoverse Technologies Ltd
- Inspection during the manufacture of modules or precursors of modules9 Apr 2026US 2026/0100395 A1MB AUTOMATION GmbH & Co. KG
- Measurement Condition Dependent, Multi-Dimensional Model Of Optical Dispersion Of Semiconductor Structures13 Nov 2025US 2025/0349623 A1
- Defect inspection system and defect inspection method19 Jun 2025US 2025/0198941 A1Samsung Electronics Co., Ltd.
Most cited
By later US patents
- Optical generator and detector of stress pulses173US 4,710,030 ABw Brown University Research Foundation · 1987
- Method of making high performance optical edge and notch filters and resulting products62US 7,123,416 B1Semrock, Inc. · 2006
- Associated dual interferometric measurement method for determining a physical property of an object49US 5,596,409 AEastman Kodak Company · 1997
- Incremental monitoring of thin films42US 4,707,611 ARockwell International Corporation · 1987
- Method for measuring refractive index and thickness of film and apparatus therefor41US 5,420,680 ARicoh Company, Ltd. · 1995