Method for measuring refractive index and thickness of film and apparatus therefor
AssigneeRicoh Company, Ltd.
InventorsTami Isobe, Tsuyoshi Nakayama
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AssigneeRicoh Company, Ltd.
InventorsTami Isobe, Tsuyoshi Nakayama
Estimating the term…
In method and apparatus for measuring a refractive index and a thickness of a thin film formed on a substrate, the thin film has m (m.gtoreq.1) layers and a transparent uppermost layer is set as a first layer. A total of (3m+1) parameters include a refractive index n(0) of an incident medium, a refractive index n(j) (j=1 to m) of a j-th layer, absorption coefficients k(j) (j=2 to m) of second to m-th layers, a refractive index n(m+1) and an absorption coefficient k(m+1) of the substrate, and thicknesses d(j) (j=2 to m) of the second to m-th layers. Arbitrary one of the (3m+1) parameters is unknown and the other 3m parameters are known. This method and apparatus measure the unknown parameter. Monochromatic light having a wavelength is incident to the film having the m-layers at a predetermined incident angle from a first layer side in the incident medium to measure reflectances about S and P polarized light. A function of the unknown parameter is specified using measured values of the reflectances, the wavelength and 3m known parameters. An equation about this function is numerically solved to determine the unknown parameter.
A method for measuring at least one of a refractive index, an absorption coefficient and a thickness of one layer of a thin film formed on a substrate, in which the thin film has m (m.gtoreq.1) layers comprising a transparent uppermost layer which is designated a first layer, in which a measured sample having the thin film and the substrate includes a total of (3m+1) parameters comprising a refractive index n(0) of an incident medium, a refractive index n(j) (j=1 to m) of a j-th layer, absorption coefficients k(j) (j=2 to m) of second to m-th layers, a refractive index n(m+1) of the substrate, an absorption coefficient k(m+1) of the substrate, and thickness d(j) (j=2 to m) of the second to m-th layers, and in which (3m) of the (3m+1) parameters are known and one of the (3m+1) parameters is unknown, said method comprising the steps of:
A method of measuring at least one of a refractive index, an absorption coefficient and a thickness of a thin film formed on a substrate, said thin film having m (m.gtoreq.1) layers comprising a transparent uppermost layer which is designated a first layer, said method of measuring comprising the steps of;
An apparatus for measuring at least one of a refractive index, an absorption coefficient and a thickness of a layer of a thin film formed on a substrate, in which the thin film has m (m.gtoreq.1) layers comprising at least a transparent uppermost layer which is designated a first layer, in which a measured sample having the thin film and the substrate includes a total of (3m+1) parameters comprising a refractive index n(0) of an incident medium, a refractive index n(j) (j=1 to m) of a j-th layer, absorption coefficients k(j) (j=2 to m) of second to m-th layers, a refractive index n(m+1) of the substrate, an absorption coefficient k(m+1) of the substrate, and thickness d(j) (j=2 to m) of the second to m-th layers, and in which (3m) of the (3m+1) parameters are known and one of the (3m+1) parameters is unknown, said apparatus comprising:
An apparatus for measuring at least one of a refractive index, an absorption coefficient and a thickness of a thin film formed on a substrate, said thin film having m (m.gtoreq.1) layers comprising a transparent uppermost layer which is designated a first layer, and
Dependencies are inferred from the claim text.