Method and device for determining at least one property of at least one layer using terahertz radiation

Method for determining at least one property of at least one first layer that is applied to a substrate using at least one measurement method based on reflection of THz radiation and/or at least one measurement method based on transmission of the THz radiation, comprising:

• determining at least one property of the substrate, which has at least one of the following elements:
• a) optical properties, b) thickness, c) magnetic permeability, d) electrical conductivity, e) roughness,
• applying the first layer to the substrate, determining the at least one property of the first layer, which has at least one of the following elements:
• a) optical properties, b) thickness, c) magnetic permeability, d) electrical conductivity, e) roughness,
• determining at least one optical property of the first layer on the basis of a) at least one measurement result of at least one measurement method based on THz radiation in relation to the first layer applied to the substrate,
• applying at least one further layer, and, determining at least one property of the at least one further layer, which has at least one of the following elements:
• a) optical properties, b) thickness, c) magnetic permeability, d) electrical conductivity, e) roughness,
• determining at least one optical property of the at least one further layer on the basis of a) at least one measurement result of at least one measurement method based on THz radiation in relation to the at least one further layer, and
• wherein the determining of the at least one optical property of the at least one further layer is additionally carried out on the basis of at least one reference layer thickness and/or at least one optical property of at least one layer applied to the substrate before the at least one further layer and/or on the basis of at least one property of the substrate.