F27D 5/0037
Supports specially adapted for semi-conductors
Official title: {Supports specially adapted for semi-conductors}
F27D5/0037 (Supports specially adapted for semi-conductors) appears on 143 US grants and 170 published applications in this corpus.
Search patents in F27D- Granted patents
- 143
- Published applications
- 170
- Assignees
- 75
- Inventors
- 391
- Latest grant
- 16 Jun 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1981 | 1 | 0 |
| 1982 | 0 | 0 |
| 1983 | 1 | 0 |
| 1984 | 0 | 0 |
| 1985 | 1 | 0 |
| 1986 | 1 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 1 | 0 |
| 1990 | 0 | 0 |
| 1991 | 1 | 0 |
| 1992 | 0 | 0 |
| 1993 | 0 | 0 |
| 1994 | 1 | 0 |
| 1995 | 0 | 0 |
| 1996 | 0 | 0 |
| 1997 | 2 | 0 |
| 1998 | 2 | 0 |
| 1999 | 1 | 0 |
| 2000 | 0 | 0 |
| 2001 | 0 | 0 |
| 2002 | 0 | 1 |
| 2003 | 1 | 1 |
| 2004 | 1 | 2 |
| 2005 | 2 | 10 |
| 2006 | 8 | 6 |
| 2007 | 4 | 11 |
| 2008 | 3 | 5 |
| 2009 | 2 | 4 |
| 2010 | 7 | 8 |
| 2011 | 7 | 4 |
| 2012 | 9 | 9 |
| 2013 | 5 | 9 |
| 2014 | 8 | 7 |
| 2015 | 5 | 9 |
| 2016 | 5 | 4 |
| 2017 | 7 | 5 |
| 2018 | 5 | 6 |
| 2019 | 5 | 2 |
| 2020 | 3 | 7 |
| 2021 | 4 | 20 |
| 2022 | 5 | 13 |
| 2023 | 10 | 8 |
| 2024 | 11 | 7 |
| 2025 | 11 | 6 |
| 2026 | 3 | 6 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Multi-zone silicon nitride wafer heater assembly having corrosion protective layer, and methods of making and using the same16 Jun 2026US 12,660,550 B2CoorsTek, Inc.
- Semiconductor process device and process chamber thereof10 Mar 2026US 12,571,103 B2Beijing Naura Microelectronics Equipment Co., Ltd.
- Treating arrangement with transfer chamber and epitaxial reactor13 Jan 2026US 12,522,947 B2Lpe S.P.A.
- Heater lift assembly spring damper30 Dec 2025US 12,512,338 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Layer with discrete islands formed on a substrate support16 Dec 2025US 12,497,697 B2APPLIED Materials.Inc.
- Sealing structure for furnace tube, and furnace tube10 Sep 2026US 2026/0266548 A1Changzhou S.C Exact Equipment Co., Ltd.
- Microwave annealing apparatus and method2 Jul 2026US 2026/0190911 A1MEI LIN ENERGY TECHNOLOGY CO., Ltd.
- Vacuum pipe assembly, support unit, and substrate treating apparatus25 Jun 2026US 2026/0177319 A1Semes Co., Ltd.
- Heater lift assembly spring damper19 Mar 2026US 2026/0082847 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Heat treatment apparatus and heat treatment method for heating substrate by light irradiation19 Mar 2026US 2026/0082849 A1SCREEN Holdings Co., Ltd.
Most cited
By later US patents
- Substrate heat treatment apparatus555US 8,608,885 B2Dainippon Screen Mfg.Co., Ltd. · 2013
- Temperature controlled substrate holder with non-uniform insulation layer for a substrate processing system550US 7,723,648 B2Tokyo Electron Limited · 2010
- Susceptor heater shim529US 9,202,727 B2ASM IP Holding B. V. · 2015
- Heat treatment jig for silicon semiconductor substrate478US 7,210,925 B2Sumitomo Mitsubishi Silicon Corporation · 2007
- Heat treatment jig for semiconductor silicon substrate477US 7,163,393 B2Sumitomo Mitsubishi Silicon Corporation · 2007