Susceptor heater shim
AssigneeASM IP Holding B.V.
InventorsTodd Dunn, Carl White, Michael Halpin, Eric Shero, Jerry Winkler
Life of this patent
Estimating the term…
Abstract
A substrate supporting assembly in a reaction space includes a heater, a substrate support member, and a shim positioned between the heater and the substrate support member. The shim may be removably secured between the heater and the substrate support member. The shim may further include an inner surface defining a perimeter of a gap. The gap may be further defined by a bottom surface of the substrate support member and a top surface of the heater. The substrate support member may further include a shoulder positioned radially outside of a substrate support position and wherein the shim inner surface is radially aligned with the substrate support member shoulder.
Claims22
A substrate supporting assembly in a reaction space comprising:
- a heater;
- a substrate support member having a top surface to receive a substrate and a shoulder about the top surface;
- and
- a shim positioned between the heater and the substrate support member, wherein the shim comprises an inner surface defining a perimeter of a gap, wherein the shim comprises an inner perimeter approximately equal an outside perimeter of the top surface and an outer perimeter approximately equal the outer perimeter of the shoulder, and
- wherein the heater provides radiant heat via the gap to the substrate support member.
A reaction chamber for processing a wafer comprising:
- a plurality of walls defining a reaction space;
- a heater movably positioned within the reaction space;
- a susceptor having a top surface to receive a substrate and a shoulder about the top surface, the susceptor positioned within the reaction space;
- a shim having an inner surface comprising an inner perimeter approximately equal an outside perimeter of the top surface and an outer perimeter approximately equal an outer perimeter of the shoulder, the shim located between the heater and the susceptor and preventing direct contact between the heater and the susceptor;
- and
- a gap formed between an inner surface of the shim, a bottom surface of the susceptor;
- and a top surface of the heater,
- wherein the gap is positioned inward of a radial envelope defined by an outer perimeter of the substrate, and
- wherein the gap allows radiant heating of a bottom surface of the susceptor.
A method of heating a susceptor comprising the steps of:
- providing a heater having a heating element within a reaction chamber;
- placing a shim on the heater;
- aligning the shim using apertures within the shim and pins extending from the heater;
- placing a susceptor on the shim, wherein the shim comprises an inner surface defining a perimeter of a gap;
- activating the heating element;
- and,
- transferring thermal energy from the heater to the susceptor by conduction and radiation.
Dependencies are inferred from the claim text.