C11D 7/3236
Aldehydes, ketones, acetals or ketals thereof
Official title: {Aldehydes, ketones, acetals or ketals thereof}
C11D7/3236 (Aldehydes, ketones, acetals or ketals thereof) appears on 12 US grants and 7 published applications in this corpus.
Search patents in C11D- Granted patents
- 12
- Published applications
- 7
- Assignees
- 9
- Inventors
- 28
- Latest grant
- 16 Jun 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1992 | 1 | 0 |
| 1993 | 0 | 0 |
| 1994 | 0 | 0 |
| 1995 | 0 | 0 |
| 1996 | 0 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 0 | 0 |
| 2000 | 2 | 0 |
| 2001 | 1 | 0 |
| 2002 | 2 | 1 |
| 2003 | 3 | 1 |
| 2004 | 0 | 0 |
| 2005 | 0 | 0 |
| 2006 | 0 | 0 |
| 2007 | 0 | 0 |
| 2008 | 0 | 0 |
| 2009 | 0 | 0 |
| 2010 | 0 | 0 |
| 2011 | 0 | 0 |
| 2012 | 0 | 0 |
| 2013 | 0 | 1 |
| 2014 | 0 | 0 |
| 2015 | 0 | 0 |
| 2016 | 0 | 0 |
| 2017 | 1 | 0 |
| 2018 | 0 | 0 |
| 2019 | 0 | 0 |
| 2020 | 0 | 2 |
| 2021 | 1 | 0 |
| 2022 | 0 | 0 |
| 2023 | 0 | 0 |
| 2024 | 0 | 2 |
| 2025 | 0 | 0 |
| 2026 | 1 | 0 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Metal residue removing liquid, metal residue removing method, and metal wiring manufacturing method16 Jun 2026US 12,655,370 B2Tokyo Ohka Kogyo.Co., Ltd.
- Cleaning agent composition for semiconductor device substrate, method of cleaning semiconductor device substrate, method of manufacturing semiconductor device substrate, and semiconductor device substrate20 Jul 2021US 11,066,627 B2Mitsubishi Chemical Corporation
- Metal free bleaching composition23 May 2017US 9,657,435 B2BASF SE
- Radioactive decontamination and translocation method25 Nov 2003US 6,652,661 B2Bobolink, Inc.
- Radioactive decontamination and translocation method12 Aug 2003US 6,605,158 B1Bobolink, Inc.
- Product having ultraviolet radiation protection19 Dec 2024US 2024/0417565 A1
- Metal residue removing liquid, metal residue removing method, and metal wiring manufacturing method11 Apr 2024US 2024/0117280 A1Tokyo Ohka Kogyo.Co., Ltd.
- Colorant catcher material11 Jun 2020US 2020/0181832 A1
- Cleaning agent composition for semiconductor device substrate, method of cleaning semiconductor device substrate, method of manufacturing semiconductor device substrate, and semiconductor device substrate2 Jan 2020US 2020/0002652 A1Mitsubishi Chemical Corporation
- Metal free bleaching composition16 May 2013US 2013/0117941 A1BASF SE
Most cited
By later US patents
- Cleaning agents comprising beta-diketone and beta-ketoimine ligands and a process for using the same36US 5,094,701 AAir Products and Chemicals, Inc. · 1992
- Processing compositions and methods of using same27US 6,030,491 AMicron Technology, Inc. · 2000
- Radioactive decontamination and translocation method13US 6,652,661 B2Bobolink, Inc. · 2003
- Processing compositions and methods of using same10US 6,207,630 B1Micron Technology, Inc. · 2001
- Radioactive decontamination and translocation method7US 6,605,158 B1Bobolink, Inc. · 2003