Cleaning agent composition for semiconductor device substrate, method of cleaning semiconductor device substrate, method of manufacturing semiconductor device substrate, and semiconductor device substrate

A cleaning agent composition for a semiconductor device substrate including at least one of wiring and an electrode in which the wiring and the electrode contain cobalt or a cobalt alloy, the cleaning agent composition comprising the following components (A), (B) and (D):

• component (A):
• at least one compound selected from the group consisting of compounds represented by Formulas (1) to (4) below,
• in Formula (1), R1 represents an alkyl group having 1 to 4 carbon atoms and R2 to R7 each independently represent a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, a carboxyl group, a carbonyl group, or a functional group having an ester bond,
• in Formula (2), R2 to R9 each independently represent a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, a carboxyl group, a carbonyl group, or a functional group having an ester bond,
• in Formula (3), X1 to X4 each independently represent a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, a carboxyl group, a carbonyl group, or a functional group having an ester bond,
• in Formula (4), X1 to X5 each independently represent a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, a carboxyl group, a carbonyl group, or a functional group having an ester bond,
• component (B):
• water;
• and
• a reducing agent as a component (D).