C08F 112/24
Phenols or alcohols
Official title: {Phenols or alcohols}
C08F112/24 (Phenols or alcohols) appears on 15 US grants and 20 published applications in this corpus.
Search patents in C08F- Granted patents
- 15
- Published applications
- 20
- Assignees
- 11
- Inventors
- 58
- Latest grant
- 29 Aug 2023
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1989 | 1 | 0 |
| 1990 | 1 | 0 |
| 1991 | 0 | 0 |
| 1992 | 0 | 0 |
| 1993 | 1 | 0 |
| 1994 | 0 | 0 |
| 1995 | 0 | 0 |
| 1996 | 0 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 0 | 0 |
| 2000 | 0 | 0 |
| 2001 | 0 | 0 |
| 2002 | 0 | 0 |
| 2003 | 0 | 0 |
| 2004 | 0 | 0 |
| 2005 | 0 | 0 |
| 2006 | 0 | 2 |
| 2007 | 0 | 0 |
| 2008 | 0 | 2 |
| 2009 | 1 | 1 |
| 2010 | 1 | 0 |
| 2011 | 1 | 0 |
| 2012 | 0 | 0 |
| 2013 | 0 | 1 |
| 2014 | 0 | 0 |
| 2015 | 0 | 0 |
| 2016 | 0 | 3 |
| 2017 | 2 | 2 |
| 2018 | 3 | 2 |
| 2019 | 0 | 0 |
| 2020 | 2 | 3 |
| 2021 | 1 | 1 |
| 2022 | 0 | 0 |
| 2023 | 1 | 2 |
| 2024 | 0 | 1 |
By publication year. Applications have been published since 2001.
Recent patents
- Photosensitive resin composition29 Aug 2023US 11,739,215 B2Zeon Corporation
- Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank including actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for manufacturing23 Feb 2021US 10,928,727 B2FUJIFILM Corporation
- Photoresist composition and a method for forming a fine pattern using the same23 Jun 2020US 10,691,018 B2Samsung Electronics Co., Ltd.
- Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank including actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for manufacturing electronic device28 Jan 2020US 10,545,405 B2FUJIFILM Corporation
- Fluoro-alcohol additives for orientation control of block copolymers7 Aug 2018US 10,040,879 B2International Business Machines Corporation
- Polymer, Resist Composition, And Patterning Process11 Apr 2024US 2024/0118617 A1Shin-Etsu Chemical Co., Ltd.
- Photoresist underlayer composition6 Apr 2023US 2023/0103371 A1Rohm and Haas Electronic Materials LLC
- Pattern formation method and method for manufacturing electronic device2 Mar 2023US 2023/0067750 A1FUJIFILM Corporation
- Polymers and photoresist compositions15 Apr 2021US 2021/0108065 A1
- Resist underlayer compositions and methods of forming patterns with such compositions5 Nov 2020US 2020/0348592 A1
Most cited
By later US patents
- Anti-oxidant macromonomers and polymers and methods of making and using the same15US 7,923,587 B2Polnox Corporation · 2011
- Process for the production of poly(4-hydroxystyrene)8US 5,274,174 AHoechst Celanese Corporation · 1993
- Process for the production of 3-mono or 3,5 disubstituted-4-acetoxystyrene, its polymerization5US 4,868,257 AHoechst Celanese Corporation · 1989
- Process for the production of 3-mono or 3,5 dihalogenated 4-acetoxystyrene, its polymerization, and hydrolysis4US 4,933,495 AHoechst Celanese Corporation · 1990
- Fluoro-alcohol additives for orientation control of block copolymers2US 9,574,107 B2International Business Machines Corporation · 2017