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US 2020/0348592 A1Published application
Resist underlayer compositions and methods of forming patterns with such compositions
OwnerJoshua Kaitz, Ke Yang +6inventors
InventorsJoshua Kaitz, Ke Yang, Keren Zhang, James F. Cameron, Li Cui, Emad Aqad, Shintaro Yamada, Paul J. LaBeaume
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Abstract
A resist underlayer composition including a polyarylene ether, an additive polymer that is different from the polyarylene ether, and a solvent, wherein the additive polymer includes an aromatic or heteroaromatic group having at least one protected or free functional group selected from hydroxy, thiol, and amino.
Claims12
A resist underlayer composition, comprising:
- a polyarylene ether,
- an additive polymer that is different from the polyarylene ether, and
- a solvent,
- wherein the additive polymer comprises an aromatic or heteroaromatic group,
- wherein the aromatic group comprises at least one protected or free functional group selected from hydroxy, thiol, and amino.
2 more elements
Dependencies are inferred from the claim text.