Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank including actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for manufacturing electronic device

An actinic ray-sensitive or radiation-sensitive resin composition comprising:

• a resin [N-A] whose dissolution rate in an alkali developer decreases by the action of an acid;
• a resin (B) having a group that decomposes by the action of an alkali developer to increase the solubility in the alkali developer and having at least one of a fluorine atom or a silicon atom;
• a resin (C) having a phenolic hydroxyl group, different from the resin (B),
• wherein the resin [N-A] has at least one of a repeating unit represented by General Formula (L-1) or a repeating unit represented by General Formula (L-2):
• wherein,
• RL1 represents a hydrogen atom, an alkyl group, or a cycloalkyl group;
• p represents 1 or 2;
• q represents an integer represented by (2-p);
• * represents a bonding arm to another atom constituting the repeating unit (L-1);
• in a case where p is 2, or r is 2 or more, a plurality of RL1's may be the same as or different from each other;
• RL2, RL3, and RL4 each independently represent a hydrogen atom, an alkyl group, a cycloalkyl group, a halogen atom, a cyano group, or an alkoxycarbonyl group;
• X1 represents a single bond, or a r+1-valent group selected from the group consisting of:
• a linear or branched hydrocarbon group, a cyclic hydrocarbon group which may contain a heteroatom as a ring member, —O—, —S—, —CO—, —SO2—, —NR—, and a group formed by combining these members;
• R represents a hydrogen atom, an alkyl group, or a group represented by —CH2ORL1 wherein RL1 has the same definition as RL1;
• r represents an integer of 1 to 5, provided that in a case where X1 is a single bond, r is 1;
• wherein,
• R1 represents a hydrogen atom, a methyl group, or a halogen atom;
• R2 and R3 each independently represent a hydrogen atom, an alkyl group, or a cycloalkyl group;
• L represents a divalent linking group or a single bond;
• Y represents a monovalent substituent excluding a methylol group;
• Z represents a hydrogen atom or a monovalent substituent;
• m represents an integer of 0 to 4;
• n represents an integer of 1 to 5;
• m+n is 5 or less;
• in a case where m is 2 or more, a plurality of Y's may be the same as or different from each other, and a plurality of Y's may be bonded to each other to form a ring structure;
• and
• in a case where n is 2 or more, a plurality of R2's, R3's, and Z's, may be the same as or different from each other;
• and a compound that generates an acid upon irradiation with actinic ray or radiation.