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US 10,928,727 B2Granted
Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank including actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for manufacturing
AssigneeFUJIFILM Corporation
InventorShuji Hirano
Life of this patent
Estimating the term…
Abstract
According to the present invention, an actinic ray-sensitive or radiation-sensitive resin composition including a compound (A) whose dissolution rate in an alkali developer decreases by the action of an acid, a hydrophobic resin (B), and a resin (C) having an aromatic ring, as well as a film, a mask blank, a pattern forming method, and a method for manufacturing an electronic device, each using the composition, are provided.
Claims13
An actinic ray-sensitive or radiation-sensitive resin composition comprising:
- a compound (A) whose dissolution rate in an alkali developer decreases by the action of an acid;
- a resin (B) including a repeating unit having one or more groups selected from the group consisting of a fluorine atom, a group having a fluorine atom, a group having a silicon atom, an alkyl group having 6 or more carbon atoms, and a cycloalkyl group having 5 or more carbon atoms;
- and
- a resin (C) having an aromatic ring, different from the resin (B),
- wherein the resin (B) further includes a repeating unit having a group which decomposes by the action of an acid, and
- wherein the resin (B) contains at least one of a repeating unit represented by General Formula (A1) or a repeating unit represented by General Formula (A2),
- wherein the repeating unit represented by General Formula (A1) is selected from the group consisting of the repeating units shown below:
- wherein the repeating unit represented by General Formula (A2) is selected from the group consisting of the repeating units shown below:
5 more elements
Dependencies are inferred from the claim text.