C07D 327/08
[b,e]-condensed with two six-membered carbocyclic rings
C07D327/08 ([b,e]-condensed with two six-membered carbocyclic rings) appears on 93 US grants and 112 published applications in this corpus.
Search patents in C07D- Granted patents
- 93
- Published applications
- 112
- Assignees
- 51
- Inventors
- 277
- Latest grant
- 4 Aug 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 6 | 0 |
| 1977 | 0 | 0 |
| 1978 | 2 | 0 |
| 1979 | 2 | 0 |
| 1980 | 3 | 0 |
| 1981 | 1 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 1 | 0 |
| 1988 | 0 | 0 |
| 1989 | 2 | 0 |
| 1990 | 1 | 0 |
| 1991 | 3 | 0 |
| 1992 | 0 | 0 |
| 1993 | 0 | 0 |
| 1994 | 2 | 0 |
| 1995 | 1 | 0 |
| 1996 | 1 | 0 |
| 1997 | 1 | 0 |
| 1998 | 0 | 0 |
| 1999 | 0 | 0 |
| 2000 | 2 | 0 |
| 2001 | 1 | 1 |
| 2002 | 2 | 2 |
| 2003 | 1 | 4 |
| 2004 | 3 | 1 |
| 2005 | 1 | 2 |
| 2006 | 0 | 2 |
| 2007 | 2 | 1 |
| 2008 | 0 | 2 |
| 2009 | 1 | 2 |
| 2010 | 3 | 2 |
| 2011 | 1 | 3 |
| 2012 | 2 | 7 |
| 2013 | 2 | 1 |
| 2014 | 3 | 3 |
| 2015 | 3 | 3 |
| 2016 | 2 | 3 |
| 2017 | 2 | 3 |
| 2018 | 8 | 7 |
| 2019 | 2 | 7 |
| 2020 | 5 | 4 |
| 2021 | 2 | 1 |
| 2022 | 4 | 9 |
| 2023 | 3 | 9 |
| 2024 | 3 | 11 |
| 2025 | 4 | 8 |
| 2026 | 5 | 14 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Onium salt, resist composition, and patterning process4 Aug 2026US 12,699,318 B2Shin-Etsu Chemical Co., Ltd.
- Salt, acid generator, resist composition and method for producing resist pattern3 Mar 2026US 12,566,375 B2Sumitomo Chemical Company, Limited
- Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method, resist film, method for manufacturing electronic device, compound, and method for producing compound17 Feb 2026US 12,554,196 B2FUJIFILM Corporation
- Salt, acid generator, resin, resist composition and method for producing resist pattern20 Jan 2026US 12,529,957 B2Sumitomo Chemical Company, Limited
- Resist composition and pattern forming process13 Jan 2026US 12,523,932 B2Shin-Etsu Chemical Co., Ltd.
- Sulfonium salt, chemically amplified resist composition, and pattern forming process30 Jul 2026US 2026/0219569 A1Shin-Etsu Chemical Co., Ltd.
- Sulfonium salt monomer, polymer, chemically amplified resist composition, and pattern forming method30 Jul 2026US 2026/0219570 A1Shin-Etsu Chemical Co., Ltd.
- Resist composition and method for producing resist pattern, and salt and resin23 Jul 2026US 2026/0211321 A1Sumitomo Chemical Company, Limited
- Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for producing electronic device9 Jul 2026US 2026/0194813 A1FUJIFILM Corporation
- Radiation-Sensitive Composition, Resist Pattern Formation Method, Acid-Generator, and Compound18 Jun 2026US 2026/0167755 A1Jsr Corporation
Most cited
By later US patents
- Compounds for and methods of inhibiting matrix metalloproteinases28US 6,117,869 AWarner-Lambert Company · 2000
- Phenyl substituted thiophenes as estrogenic agents21US 6,835,745 B2Wyeth · 2004
- Polycyclic photoinitiators16US 10,113,075 B2Igm Malta Limited · 2018
- Polycyclic glyoxylates as photoinitiators16US 10,597,515 B2Igm Group B. V. · 2020
- Compounds having pharmacological properties16US 4,192,818 ADuphar International Research B.V. · 1980