C07C 309/17
Containing carboxyl groups bound to the carbon skeleton
Official title: containing carboxyl groups bound to the carbon skeleton
C07C309/17 (Containing carboxyl groups bound to the carbon skeleton) appears on 254 US grants and 238 published applications in this corpus.
Search patents in C07C- Granted patents
- 254
- Published applications
- 238
- Assignees
- 114
- Inventors
- 560
- Latest grant
- 26 May 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 13 | 0 |
| 1977 | 1 | 0 |
| 1978 | 0 | 0 |
| 1979 | 0 | 0 |
| 1980 | 0 | 0 |
| 1981 | 0 | 0 |
| 1982 | 1 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 1 | 0 |
| 1986 | 0 | 0 |
| 1987 | 1 | 0 |
| 1988 | 1 | 0 |
| 1989 | 0 | 0 |
| 1990 | 1 | 0 |
| 1991 | 0 | 0 |
| 1992 | 0 | 0 |
| 1993 | 1 | 0 |
| 1994 | 2 | 0 |
| 1995 | 8 | 0 |
| 1996 | 4 | 0 |
| 1997 | 9 | 0 |
| 1998 | 18 | 0 |
| 1999 | 7 | 0 |
| 2000 | 3 | 0 |
| 2001 | 2 | 0 |
| 2002 | 2 | 3 |
| 2003 | 1 | 4 |
| 2004 | 1 | 3 |
| 2005 | 2 | 6 |
| 2006 | 1 | 3 |
| 2007 | 5 | 10 |
| 2008 | 2 | 9 |
| 2009 | 5 | 8 |
| 2010 | 6 | 17 |
| 2011 | 8 | 16 |
| 2012 | 12 | 18 |
| 2013 | 14 | 13 |
| 2014 | 15 | 7 |
| 2015 | 18 | 7 |
| 2016 | 11 | 15 |
| 2017 | 11 | 8 |
| 2018 | 8 | 17 |
| 2019 | 8 | 8 |
| 2020 | 10 | 6 |
| 2021 | 9 | 14 |
| 2022 | 6 | 10 |
| 2023 | 10 | 11 |
| 2024 | 6 | 10 |
| 2025 | 4 | 10 |
| 2026 | 6 | 5 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Method for producing actinic ray-sensitive or radiation-sensitive resin composition, pattern formation method, and method for manufacturing electronic device26 May 2026US 12,638,768 B2FUJIFILM Corporation
- Salt, acid generator, resist composition and method for producing resist pattern12 May 2026US 12,624,016 B2Sumitomo Chemical Company, Limited
- Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, method for manufacturing electronic device, and compound24 Mar 2026US 12,585,187 B2FUJIFILM Corporation
- Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method, resist film, method for manufacturing electronic device, compound, and method for producing compound17 Feb 2026US 12,554,196 B2FUJIFILM Corporation
- Salt, acid generator, resist composition and method for producing resist pattern10 Feb 2026US 12,547,073 B2Sumitomo Chemical Company, Limited
- Radiation-sensitive composition, method for forming pattern, and onium salt23 Jul 2026US 2026/0211323 A1Jsr Corporation
- Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for producing electronic device9 Jul 2026US 2026/0194813 A1FUJIFILM Corporation
- Sulfonium salt monomer, sulfonium salt quencher, polymer, chemically amplified resist composition, and patterning method19 Feb 2026US 2026/0050217 A1Shin-Etsu Chemical Co., Ltd.
- Salt, acid generator, resin, resist composition and method for producing resist pattern29 Jan 2026US 2026/0029709 A1Sumitomo Chemical Company, Limited
- Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for producing electronic device1 Jan 2026US 2026/0003268 A1FUJIFILM Corporation
Most cited
By later US patents
- Acid generator, sulfonic acid, sulfonic acid derivatives and radiation-sensitive resin composition83US 6,908,722 B2Jsr Corporation · 2005
- Salt suitable for an acid generator and a chemically amplified resist composition containing the same65US 7,304,175 B2Sumitomo Chemical Company, Limited · 2007
- Amino acid derivative anticonvulsant44US 5,378,729 AResearch Corporation Technologies, Inc. · 1995
- Amino acid derivative anticonvulsant44US 5,654,301 AResearch Corporation Technologies, Inc. · 1997
- Salt suitable for an acid generator and a chemically amplified resist composition containing the same33US 7,301,047 B2Sumitomo Chemical Company, Limited · 2007