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US 12,638,768 B2Granted
Method for producing actinic ray-sensitive or radiation-sensitive resin composition, pattern formation method, and method for manufacturing electronic device
AssigneeFUJIFILM Corporation
InventorsTakamitsu Tomiga, Kohei Higashi, Fumihiro Yoshino, Yuma Kurumisawa, Takumi Tanaka
Life of this patent
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Abstract
A method for producing an actinic ray-sensitive or radiation-sensitive resin composition, comprising: preparing an intermediate solution which includes a photoacid generator and a solvent; and mixing the intermediate solution with at least a resin to prepare an actinic ray-sensitive or radiation-sensitive resin composition having a viscosity of 10 mPa·s or more.
Claims7
A method for producing an actinic ray-sensitive or radiation-sensitive resin composition, comprising:
- preparing an intermediate solution which includes a photoacid generator and a solvent;
- and
- mixing the intermediate solution with at least a resin having a polarity that increases by the action of an acid to prepare an actinic ray-sensitive or radiation-sensitive resin composition having a viscosity of 10 mPa·s or more.
Dependencies are inferred from the claim text.