Salt, acid generator, resin, resist composition and method for producing resist pattern
AssigneeSumitomo Chemical Company, Limited
InventorsShohei TERAHIGASHI, Koji ICHIKAWA
Life of this patent
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AssigneeSumitomo Chemical Company, Limited
InventorsShohei TERAHIGASHI, Koji ICHIKAWA
Estimating the term…
Disclosed are a salt represented by formula (I1) or formula (I2), an acid generator, a resin and a resist composition: wherein Q1, Q2, R1 and R2 each independently represent a H atom, a F atom, a perfluoroalkyl group or an alkyl group, z represents an integer of 0 to 6, X1 represents *—CO—O—, *—O—CO—, *—O—CO—O— or *—O—, L1 represents a single bond or a substituted/unsubstituted hydrocarbon group, R3 and R4 each represent a halogen atom other than an I atom, a haloalkyl group, etc., m3 and m5 represent an integer of 1 to 3, m4 represents an integer of 0 to 3, m6 represents an integer of 1 to 4, R5 represents a H atom, a halogen atom, or a alkyl group which may have a halogen atom, and ZI+ represents an organic cation.
A salt represented by formula (I1) or formula (I2):
Dependencies are inferred from the claim text.