US 12,585,187 B2Granted

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, method for manufacturing electronic device, and compound

AssigneeFUJIFILM Corporation

InventorsMasafumi Kojima, Akira Takada, Akiyoshi Goto, Takeshi Kawabata, Aina Ushiyama

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Abstract

Provided is an actinic ray-sensitive or radiation-sensitive resin composition with which a pattern having a good shape can be obtained. Also provided is a resist film, a pattern forming method, and a method for manufacturing an electronic device, each relating to the actinic ray-sensitive or radiation-sensitive resin composition. Also provided is a compound which can be suitably used in the actinic ray-sensitive or radiation-sensitive resin composition. The actinic ray-sensitive or radiation-sensitive resin composition of an embodiment of the present invention includes a compound that generates an acid upon irradiation with actinic rays or radiation, an acid-decomposable resin having a weight-average molecular weight of 30,000 or less, and a solvent, and the compound that generates an acid upon irradiation with actinic rays or radiation includes a compound (I).

Claims20

Dependent claims

An actinic ray-sensitive or radiation-sensitive resin composition comprising:

a compound that generates an acid upon irradiation with actinic rays or radiation, and
a resin of which polarity increases through decomposition by an action of an acid, having a weight-average molecular weight of 30,000 or less,
wherein the compound that generates an acid upon irradiation with actinic rays or radiation includes the following compound (I),
Compound (I):
a compound having two or more of the following structural moieties X and one of the following structural moiety Y
Structural moiety X:
a structural moiety which consists of an anionic moiety A1− and a cationic moiety C1+, and forms a first acidic moiety represented by HA1 upon irradiation with actinic rays or radiation,
Structural moiety Y:
a structural moiety which consists of an anionic moiety B1− and a cationic moiety C2+, and forms a second acidic moiety represented by HB1 upon irradiation with actinic rays or radiation,
the compound generating an acid including the two or more of the first acidic moieties derived from the structural moieties X and the second acidic moiety derived from the structural moiety Y upon irradiation with actinic rays or radiation,
provided that the compound (I) satisfies the following condition I,
Condition I:
a compound PI formed by substituting the cationic moiety C1+ in the structural moiety X and the cationic moiety C2+ in the structural moiety Y with H+ in the compound (I) has an acid dissociation constant a derived from an acidic moiety represented by HA1, formed by substituting the cationic moiety C1+ in the structural moiety X with H+, and an acid dissociation constant b derived from an acidic moiety represented by HB1, formed by substituting the cationic moiety C2+ in the structural moiety Y with H+, and the acid dissociation constant b is larger than the acid dissociation constant a.

10 more elements

A compound represented by any one of Formula (I)-1, (I)-2, or (I)-3,

in Formula (I)-1, A11− and A12− each independently represent a monovalent anionic functional group, B11− represents a divalent anionic functional group, C11+, C12+, and C21+ each independently represent an organic cation, and L11 and L12 each independently represent a divalent organic group,
provided that in a compound PI-1 formed by substituting organic cations represented by C11+, C12+, and C21+ with H+ in Formula (I)-1, an acid dissociation constant b1 derived from an acidic moiety represented by B11H is larger than an acid dissociation constant a1 derived from an acidic moiety represented by HA11 and an acid dissociation constant a2 derived from the acidic moiety represented by HA12,
in Formula (I)-2, A13− and B12− each independently represent a monovalent anionic functional group, A14− represents a divalent anionic functional group, C13+, C14+, and C22+ each independently represent an organic cation, and L13 and L14 each independently represent a divalent organic group,
provided that in a compound PI-2 formed by substituting organic cations represented by C13+, C14+, and C22+ with H+ in Formula (I)-2, an acid dissociation constant b2 derived from an acidic moiety represented by B12H is larger than an acid dissociation constant a3 derived from an acidic moiety represented by HA13 and an acid dissociation constant a4 derived from an acidic moiety represented by HA14,
in Formula (I)-3, A15−, A16−, and B13− each independently represent a monovalent anionic functional group, C15+, C16+, and C23+ each independently represent an organic cation, and L15 represents a trivalent organic group,
provided that in a compound PI-3 formed by substituting organic cations represented by C15+, C16+, and C23+ with H+ in Formula (I)-3, an acid dissociation constant b3 derived from an acidic moiety represented by B13H is larger than an acid dissociation constant a5 derived from an acidic moiety represented by HA15 and an acid dissociation constant a6 derived from an acidic moiety represented by HA16.

3 more elements

Dependencies are inferred from the claim text.

Facts

Application: 18/063,395Filed 8 Dec 2022 · continuation
Priority: JP 2020-10100910 Jun 2020
Published: US 2023/0139891 A14 May 2023
Granted: 24 Mar 2026
Term ends: Not estimatedThe source records don’t support an estimate.

Classification15 codes

C07D 251/32
Only oxygen atoms: cyanuric acid; Isocyanuric acid
G03F 7/0392
Macromolecular compounds which are photodegradable, e.g. positive electron resists: the macromolecular compound being present in a chemically…
C07C 309/07
Of an acyclic saturated carbon skeleton: containing oxygen atoms bound to the carbon skeleton
C07C 309/17
Of an acyclic saturated carbon skeleton: containing carboxyl groups bound to the carbon skeleton