Salt suitable for an acid generator and a chemically amplified resist composition containing the same
AssigneeSumitomo Chemical Company, Limited
InventorsIsao Yoshida, Yukako Harada, Satoshi Yamaguchi
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AssigneeSumitomo Chemical Company, Limited
InventorsIsao Yoshida, Yukako Harada, Satoshi Yamaguchi
Estimating the term…
The present invention provides a salt of the formula (I): wherein ring X represents monocyclic or bicyclic hydrocarbon group having 3 to 30 carbon atoms, and one or more hydrogen atom in the ring X is optionally substituted with alkyl group having 1 to 6 carbon atoms, alkenyl group having 2 to 6 carbon atoms, alkoxy group having 2 to 6 carbon atoms or perfluoroalkyl group having 1 to 4 carbon atoms; Q1 and Q2 each independently represent fluorine atom or perfluoroalkyl group having 1 to 6 carbon atoms; A+ represents organic counter ion; and n shows an integer of 1 to 12. The present invention also provides a chemically amplified resist composition comprising the salt of the formula (I).
A salt of the formula (I):
A process for producing a salt of the formula (I)
A chemically amplified resist composition comprising a salt of the formula (I)
Dependencies are inferred from the claim text.