C03C 17/3665
Specially adapted for use as photomask
Official title: {specially adapted for use as photomask}
C03C17/3665 (Specially adapted for use as photomask) appears on 28 US grants and 33 published applications in this corpus.
Search patents in C03C- Granted patents
- 28
- Published applications
- 33
- Assignees
- 11
- Inventors
- 61
- Latest grant
- 4 Aug 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 2000 | 1 | 0 |
| 2001 | 1 | 0 |
| 2002 | 1 | 1 |
| 2003 | 1 | 1 |
| 2004 | 1 | 2 |
| 2005 | 1 | 4 |
| 2006 | 0 | 2 |
| 2007 | 2 | 7 |
| 2008 | 2 | 1 |
| 2009 | 0 | 1 |
| 2010 | 5 | 3 |
| 2011 | 2 | 0 |
| 2012 | 1 | 1 |
| 2013 | 0 | 1 |
| 2014 | 1 | 0 |
| 2015 | 0 | 1 |
| 2016 | 2 | 1 |
| 2017 | 0 | 1 |
| 2018 | 2 | 1 |
| 2019 | 1 | 0 |
| 2020 | 0 | 0 |
| 2021 | 0 | 2 |
| 2022 | 1 | 1 |
| 2023 | 1 | 0 |
| 2024 | 1 | 2 |
| 2025 | 0 | 0 |
| 2026 | 1 | 0 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Multilayered-reflective-film-provided substrate, reflective mask blank, reflective mask, method of manufacturing reflective mask, and method of manufacturing semiconductor device4 Aug 2026US 12,699,314 B2Hoya Corporation
- Mask blank glass substrate15 Oct 2024US 12,117,724 B2Shin-Etsu Chemical Co., Ltd.
- Mask blank glass substrate5 Dec 2023US 11,835,853 B2Shin-Etsu Chemical Co., Ltd.
- Imprint mold-forming synthetic quartz glass substrate2 Aug 2022US 11,402,751 B2Shin-Etsu Chemical Co., Ltd.
- Mask blank substrate, substrate with multilayer reflection film, transmissive mask blank, reflective mask, and semiconductor device fabrication method21 May 2019US 10,295,900 B2Hoya Corporation
- Reflective mask blank, reflective mask, reflective mask manufacturing method, and semiconductor device manufacturing method29 Feb 2024US 2024/0069428 A1Hoya Corporation
- Mask Blank Glass Substrate15 Feb 2024US 2024/0053675 A1Shin-Etsu Chemical Co., Ltd.
- Imprint mold-forming synthetic quartz glass substrate24 Mar 2022US 2022/0091501 A1Shin-Etsu Chemical Co., Ltd.
- Mask Blank Glass Substrate9 Dec 2021US 2021/0382386 A1Shin-Etsu Chemical Co., Ltd.
- Multilayered-reflective-film-provided substrate, reflective mask blank, reflective mask, method of manufacturing reflective mask, and method of manufacturing semiconductor device1 Apr 2021US 2021/0096456 A1Hoya Corporation
Most cited
By later US patents
- Double-metal EUV mask absorber9US 6,913,706 B2Intel Corporation · 2005
- Reflective mask blank having a programmed defect and method of producing the same, reflective mask having a programmed defect and method of producing the same, and substrate for use in producing the reflective mask blank or the reflective mask having a programmed defect9US 7,282,305 B2Hoya Corporation · 2007
- Transparent optical device and fabrication method thereof8US 6,372,392 B1Fujitsu Limited · 2002
- High reflectance-low stress Mo-Si multilayer reflective coatings7US 6,110,607 AThe Regents of the University of California · 2000
- Process for fabricating high reflectance-low stress Mo—Si multilayer reflective coatings7US 6,309,705 B1The Regents of the University of California · 2001