Reflective mask blank having a programmed defect and method of producing the same, reflective mask having a programmed defect and method of producing the same, and substrate for use in producing the reflective mask blank or the reflective mask having a programmed defect

A method of producing a reflective mask blank comprising a substrate and a reflective multilayer film formed on the substrate to reflect exposure light, the method comprising the steps of:

• forming a base pattern comprising a predetermined irregularity on a principal surface of the substrate;
• and
• forming the reflective multilayer film on the base pattern to thereby form a step portion on a principal surface of the reflective multilayer film corresponding to the base pattern so that a programmed defect is formed on the reflective multilayer film;
• the reflective multilayer being deposited by sputtering in a condition that the substrate is placed so that the principal surface of the substrate is inclined at an angle with respect to a surface of a sputter target for deposition of the multilayer reflective film and the substrate is rotated around a rotation axis which is a normal passing through the center of the principal surface of the substrate.