Loading patent…
AssigneeThe Regents of the University of California
InventorsClaude Montcalm, Paul B. Mirkarimi
Estimating the term…
A high reflectance-low stress Mo-Si multilayer reflective coating particularly useful for the extreme ultraviolet (EUV) wavelength region. While the multilayer reflective coating has particular application for EUV lithography, it has numerous other applications where high reflectance and low stress multilayer coatings are utilized. Multilayer coatings having high near-normal incidence reflectance (R.gtoreq.65%) and low residual stress (.ltoreq.100 MPa) have been produced using thermal and non-thermal approaches. The thermal approach involves heating the multilayer coating to a given temperature for a given time after deposition in order to induce structural changes in the multilayer coating that will have an overall "relaxation" effect without reducing the reflectance significantly.
An article of manufacture, consisting essentially of a Mo-Si multilayer coating on a substrate, the coating having a near normal incidence reflectance of at least 65% in the extreme ultraviolet region, and a magnitude of residual stress of no greater than 100 MPa.
A Mo-Si multilayer reflective coating having a magnitude of residual stress of not greater than 100 MPa and a near normal incidence reflectance of at least 65% produced by the method including:
Dependencies are inferred from the claim text.