C01B 33/10773
Halogenated silanes obtained by disproportionation and molecular rearrangement of halogenated silanes
Official title: {Halogenated silanes obtained by disproportionation and molecular rearrangement of halogenated silanes}
C01B33/10773 (Halogenated silanes obtained by disproportionation and molecular rearrangement of halogenated silanes) appears on 46 US grants and 61 published applications in this corpus.
Search patents in C01B- Granted patents
- 46
- Published applications
- 61
- Assignees
- 39
- Inventors
- 162
- Latest grant
- 4 Aug 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 1 | 0 |
| 1977 | 2 | 0 |
| 1978 | 0 | 0 |
| 1979 | 0 | 0 |
| 1980 | 0 | 0 |
| 1981 | 0 | 0 |
| 1982 | 0 | 0 |
| 1983 | 1 | 0 |
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| 1985 | 2 | 0 |
| 1986 | 3 | 0 |
| 1987 | 1 | 0 |
| 1988 | 2 | 0 |
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| 1990 | 0 | 0 |
| 1991 | 1 | 0 |
| 1992 | 2 | 0 |
| 1993 | 0 | 0 |
| 1994 | 0 | 0 |
| 1995 | 0 | 0 |
| 1996 | 0 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 0 | 0 |
| 2000 | 0 | 0 |
| 2001 | 0 | 0 |
| 2002 | 0 | 0 |
| 2003 | 0 | 0 |
| 2004 | 0 | 1 |
| 2005 | 0 | 0 |
| 2006 | 0 | 0 |
| 2007 | 0 | 0 |
| 2008 | 1 | 2 |
| 2009 | 1 | 2 |
| 2010 | 0 | 6 |
| 2011 | 2 | 9 |
| 2012 | 2 | 8 |
| 2013 | 0 | 9 |
| 2014 | 2 | 3 |
| 2015 | 4 | 0 |
| 2016 | 4 | 6 |
| 2017 | 5 | 6 |
| 2018 | 3 | 2 |
| 2019 | 2 | 0 |
| 2020 | 0 | 0 |
| 2021 | 1 | 2 |
| 2022 | 1 | 0 |
| 2023 | 0 | 1 |
| 2024 | 0 | 2 |
| 2025 | 2 | 0 |
| 2026 | 1 | 2 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Method for fabricating trihalodisilane and method for fabricating semiconductor device using the same4 Aug 2026US 12,698,212 B2Samsung Electronics Co., Ltd.
- Method of preparing iodosilanes and compositions therefrom4 Nov 2025US 12,459,824 B2Entegris, Inc.
- Synthesis of 1,1,1-trichlorodisilane1 Apr 2025US 12,264,074 B2Nata Semiconductor Materials Co., Ltd.
- Transsilylation catalysis31 May 2022US 11,345,604 B2DDP Specialty Electronic Materials US 9, LLC
- Process for the cleavage of silicon-silicon bonds and/or silicon-chlorine bonds in mono-, poly- and/or oligosilanes31 Aug 2021US 11,104,582 B2Momentive Performance Materials Inc.
- Method for producing halotrisilane and method for manufacturing semiconductor devices using the same12 Mar 2026US 2026/0070792 A1Samsung Electronics Co., Ltd.
- Method of preparing iodosilanes and compositions therefrom5 Feb 2026US 2026/0035252 A1Entegris, Inc.
- Method of preparing iodosilanes and compositions therefrom17 Oct 2024US 2024/0343591 A1Entegris, Inc.
- Synthesis of 1,1,1-trichlorodisilane1 Aug 2024US 2024/0253997 A1DDP Specialty Electronic Materials US 9, LLC
- Method for fabricating trihalodisilane and method for fabricating semiconductor device using the same24 Aug 2023US 2023/0264963 A1Wonik Materials
Most cited
By later US patents
- Waste treatment in silicon production operations37US 4,519,999 AUnion Carbide Corporation · 1985
- Process for making silane22US 3,968,199 AUnion Carbide Corporation · 1976
- Method and apparatus for the preparation of dichlorosilane22US 5,026,533 AHuls Troisdorf Aktiengesellschaft · 1991
- Recovery of lower-boiling silanes in a CVD process17US 5,118,485 AHemlock Semiconductor Corporation · 1992
- Chlorosilane disproportionation catalyst and method for producing a silane compound by means of the catalyst16US 4,610,858 ADenki Kagaku Kogyo Kabushiki Kaisha · 1986