Synthesis of 1,1,1-trichlorodisilane
AssigneeNata Semiconductor Materials Co., Ltd.
InventorsAndrew Millward, Brian D. Rekken, Travis Sunderland, Jeanette K. Young, Xiaobing Zhou
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Abstract
A method of making a trihalodisilane, the method comprising: combining a reductive effective amount of an alkylaluminum hydride, a halodisilane comprising at least 4 halogen atoms, and a solvent at a temperature <80° C. and reducing the halodisilane to form a reaction product mixture comprising a trihalodisilane and an alkylaluminum halide.
Claims13
A method of making a trihalodisilane, the method comprising:
- combining a reductive effective amount of an alkylaluminum hydride, a halodisilane comprising at least 4 halogen atoms, and a solvent at a temperature <150° C. and reducing the halodisilane to form a reaction product mixture comprising a trihalodisilane, an alkylaluminum halide, and the solvent.
A trihalodisilane composition, comprising:
- <2% (w/w) of an alkylsilane and >98% (w/w) of a trihalodisilane, wherein the composition further comprises an alkylaluminum halide.
A method of depositing a silicon-containing film on a substrate, the method comprising, introducing a trihalodisilane composition into a reactor with a substrate and, optionally, additional reactants under deposition sufficient conditions to form a silicon-containing film on the substrate, wherein the trihalodisilane composition comprises <2% (w/w) of an alkylsilane, >98% (w/w) of a trihalodisilane, and an alkylaluminum halide.
Dependencies are inferred from the claim text.