Y10S 438/941
Loading effect mitigation
Y10S438/941 (Loading effect mitigation) appears on 26 US grants and 6 published applications in this corpus.
Search patents in Y10S- Granted patents
- 26
- Published applications
- 6
- Assignees
- 10
- Inventors
- 40
- Latest grant
- 6 May 2008
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1980 | 1 | 0 |
| 1981 | 0 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 1 | 0 |
| 1991 | 1 | 0 |
| 1992 | 0 | 0 |
| 1993 | 0 | 0 |
| 1994 | 0 | 0 |
| 1995 | 1 | 0 |
| 1996 | 2 | 0 |
| 1997 | 6 | 0 |
| 1998 | 4 | 0 |
| 1999 | 2 | 0 |
| 2000 | 1 | 0 |
| 2001 | 0 | 0 |
| 2002 | 0 | 0 |
| 2003 | 1 | 1 |
| 2004 | 1 | 1 |
| 2005 | 1 | 3 |
| 2006 | 3 | 1 |
| 2007 | 0 | 0 |
| 2008 | 1 | 0 |
By publication year. Applications have been published since 2001.
Recent patents
- Methods of fabricating multiple sets of field effect transistors6 May 2008US 7,368,372 B2Micron Technology, Inc.
- Methods of fabricating multiple sets of field effect transistors27 Jun 2006US 7,067,378 B2Micron Technology, Inc.
- Methods of fabricating multiple sets of field effect transistors13 Jun 2006US 7,060,569 B2Micron Technology, Inc.
- Methods of fabricating multiple sets of field effect transistors13 Jun 2006US 7,060,570 B2Micron Technology, Inc.
- Methods of fabricating multiple sets of field effect transistors9 Aug 2005US 6,927,135 B2Micron Technology, Inc.
- Methods of fabricating multiple sets of field effect transistors27 Jul 2006US 2006/0166445 A1Micron Technology, Inc.
- Methods of fabricating multiple sets of field effect transistors13 Jan 2005US 2005/0009278 A1Micron Technology, Inc.
- Methods of fabricating multiple sets of field effect transistors13 Jan 2005US 2005/0009279 A1Micron Technology, Inc.
- Methods of fabricating multiple sets of field effect transistors13 Jan 2005US 2005/0009280 A1Micron Technology, Inc.
- Methods of fabricating multiple sets of field effect transistors24 Jun 2004US 2004/0121548 A1Micron Technology, Inc.
Most cited
By later US patents
- Semiconductor processing system with gas curtain612US 5,997,588 AAdvanced Semiconductor Materials America, Inc. · 1999
- Uniform dielectric film deposition on textured surfaces542US 5,801,104 AMicron Technology, Inc. · 1998
- Semiconductor wafer for improved chemical-mechanical polishing over large area features63US 5,681,423 AMicron Technology, Inc. · 1997
- Method of performing plain etching treatment and apparatus therefor39US 5,415,728 AKabushiki Kaisha Toshiba · 1995
- Plasma reactor with enhanced plasma uniformity by gas addition, reduced chamber diameter and reduced RF wafer pedestal diameter38US 6,125,788 AAPPLIED Materials.Inc. · 2000