Y10S 438/905
Cleaning of reaction chamber
Y10S438/905 (Cleaning of reaction chamber) appears on 489 US grants and 275 published applications in this corpus.
Search patents in Y10S- Granted patents
- 489
- Published applications
- 275
- Assignees
- 160
- Inventors
- 946
- Latest grant
- 9 Oct 2018
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1982 | 1 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 1 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 3 | 0 |
| 1990 | 4 | 0 |
| 1991 | 2 | 0 |
| 1992 | 1 | 0 |
| 1993 | 2 | 0 |
| 1994 | 4 | 0 |
| 1995 | 10 | 0 |
| 1996 | 11 | 0 |
| 1997 | 15 | 0 |
| 1998 | 25 | 0 |
| 1999 | 23 | 0 |
| 2000 | 36 | 0 |
| 2001 | 42 | 22 |
| 2002 | 41 | 32 |
| 2003 | 35 | 43 |
| 2004 | 43 | 47 |
| 2005 | 38 | 26 |
| 2006 | 25 | 18 |
| 2007 | 20 | 19 |
| 2008 | 13 | 22 |
| 2009 | 24 | 16 |
| 2010 | 23 | 11 |
| 2011 | 23 | 8 |
| 2012 | 11 | 4 |
| 2013 | 3 | 4 |
| 2014 | 6 | 1 |
| 2015 | 1 | 0 |
| 2016 | 0 | 1 |
| 2017 | 1 | 1 |
| 2018 | 2 | 0 |
By publication year. Applications have been published since 2001.
Recent patents
- Method and system for supplying a cleaning gas into a process chamber9 Oct 2018US 10,094,486 B2APPLIED Materials.Inc.
- Hydrogen plasma based cleaning process for etch hardware17 Jul 2018US 10,026,597 B2APPLIED Materials.Inc.
- Methods for in-situ chamber clean utilized in an etching processing chamber3 Jan 2017US 9,533,332 B2APPLIED Materials.Inc.
- Method and system for supplying a cleaning gas into a process chamber8 Dec 2015US 9,206,511 B2APPLIED Materials.Inc.
- Method and apparatus for inducing turbulent flow of a processing chamber cleaning gas16 Dec 2014US 8,910,644 B2APPLIED Materials.Inc.
- Hydrogen plasma based cleaning process for etch hardware13 Jul 2017US 2017/0200590 A1APPLIED Materials.Inc.
- Method and system for supplying a cleaning gas into a process chamber24 Mar 2016US 2016/0084400 A1APPLIED Materials.Inc.
- Method and system for supplying a cleaning gas into a process chamber20 Mar 2014US 2014/0076236 A1APPLIED Materials.Inc.
- Method of recovering ammonia and method of recycling ammonia by using the same28 Nov 2013US 2013/0312456 A1Japan Pionics Co., Ltd.
- Method and system for supplying a cleaning gas into a process chamber22 Aug 2013US 2013/0213574 A1APPLIED Materials.Inc.
Most cited
By later US patents
- Compartnetalized substrate processing chamber732US 5,730,801 AAPPLIED Materials.Inc. · 1998
- Remote plasma source seasoning624US 7,989,365 B2APPLIED Materials.Inc. · 2011
- Surface-treated shower head for use in a substrate processing chamber584US 6,182,603 B2Applied Komatsu Technology, Inc. · 2001
- Accelerated plasma clean584US 6,374,831 B1APPLIED Materials.Inc. · 2002
- Method of in situ cleaning a vacuum plasma processing chamber582US 5,679,215 ALam Research Corporation · 1997