Method and system for supplying a cleaning gas into a process chamber

A valve for selectively controlling flow between a first gas conduit and a second gas conduit, comprising:

• a valve body;
• a flapper housed by the valve body, wherein the flapper is operable to rotate about a centerline of the flapper in the valve body between a first position where the flapper blocks flow through the valve body and a second position where the flapper allows flow through the valve body;
• a first magnet encased in the valve body;
• a second magnet encased in the flapper, wherein the first magnet and the second magnet form a pair of repelling magnets to levitate the flapper along the centerline within the valve body;
• a coupling mechanism disposed outside the valve body to rotate the flapper through magnetic interaction,
• wherein the flapper comprises:
• a flow-obstructing plate;
• and
• an outer body attached to the flow-obstructing plate, the outer body including a first end and a second end, wherein the outer body interacts with the coupling mechanism,
• wherein the flow-obstructing plate extends from the second end of the outer body, the second end of the outer body includes a plurality of depressions formed therein to engage with projections from a bearing disposed between the outer body and the valve body, the first end of the outer body has a recess, a cap is inserted in the recess, the cap includes a cross-hole formed perpendicularly to the centerline of the flapper, and one or more drive magnets are captured in the cross-hole.