Y10S 148/138
Roughened surface
Y10S148/138 (Roughened surface) appears on 36 US grants and 1 published applications in this corpus.
Search patents in Y10S- Granted patents
- 36
- Published applications
- 1
- Assignees
- 19
- Inventors
- 71
- Latest grant
- 26 Nov 2019
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1978 | 1 | 0 |
| 1979 | 1 | 0 |
| 1980 | 0 | 0 |
| 1981 | 1 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 1 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 1 | 0 |
| 1991 | 0 | 0 |
| 1992 | 2 | 0 |
| 1993 | 3 | 0 |
| 1994 | 3 | 0 |
| 1995 | 4 | 0 |
| 1996 | 3 | 0 |
| 1997 | 4 | 0 |
| 1998 | 2 | 0 |
| 1999 | 5 | 0 |
| 2000 | 3 | 0 |
| 2001 | 1 | 0 |
| 2002 | 0 | 0 |
| 2003 | 0 | 0 |
| 2004 | 0 | 0 |
| 2005 | 0 | 0 |
| 2006 | 0 | 0 |
| 2007 | 0 | 0 |
| 2008 | 0 | 0 |
| 2009 | 0 | 0 |
| 2010 | 0 | 0 |
| 2011 | 0 | 0 |
| 2012 | 0 | 0 |
| 2013 | 0 | 0 |
| 2014 | 0 | 0 |
| 2015 | 0 | 0 |
| 2016 | 0 | 0 |
| 2017 | 0 | 0 |
| 2018 | 0 | 1 |
| 2019 | 1 | 0 |
By publication year. Applications have been published since 2001.
Recent patents
- Bonded structure and method for manufacturing the same26 Nov 2019US 10,486,391 B2Honda Motor Co., Ltd.
- Method of manufacturing a chip type electronic element9 Jan 2001US 6,171,884 B2Murata Manufacturing Co., Ltd.
- Method of manufacturing a semiconductor device having a capacitor3 Oct 2000US 6,127,240 AMitsubishi Denki Kabushiki Kaisha
- Method of forming rough polysilicon surfaces suitable for capacitor construction11 Jul 2000US 6,087,240 AMicron Technology, Inc.
- Semiconductor processing method of providing a conductively doped layer of hemispherical grain polysilicon and a hemispherical grain polysilicon layer produced according to the method18 Jan 2000US 6,015,743 A
Most cited
By later US patents
- Metal silicide texturizing technique430US 5,182,232 AMicron Technology, Inc. · 1993
- Method for forming enhanced capacitance stacked capacitor structures using hemi-spherical grain polysilicon207US 5,340,765 AMicron Semiconductor, Inc. · 1994
- Method of making a semiconductor integrated circuit device having a capacitor with a porous surface of an electrode87US 5,372,962 ANEC Corporation · 1994
- Methods of patterning and manufacturing semiconductor devices69US 5,256,587 AGoldstar Electron Co., Ltd. · 1993
- Method for manufacturing a capacitor having a rough electrode surface68US 5,318,920 AMitsubishi Denki Kabushiki Kaisha · 1994