H10P 70/58
Cleaning of porous materials
Official title: {Cleaning of porous materials}
H10P70/58 (Cleaning of porous materials) appears on 6 US grants and 9 published applications in this corpus.
Search patents in H10P- Granted patents
- 6
- Published applications
- 9
- Assignees
- 6
- Inventors
- 19
- Latest grant
- 18 Sep 2018
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 2004 | 0 | 3 |
| 2005 | 0 | 1 |
| 2006 | 0 | 0 |
| 2007 | 0 | 0 |
| 2008 | 0 | 1 |
| 2009 | 1 | 0 |
| 2010 | 0 | 0 |
| 2011 | 1 | 0 |
| 2012 | 0 | 1 |
| 2013 | 0 | 0 |
| 2014 | 0 | 0 |
| 2015 | 1 | 2 |
| 2016 | 1 | 1 |
| 2017 | 1 | 0 |
| 2018 | 1 | 0 |
By publication year.
Recent patents
- Liquid chemical for forming water repellent protecting film, and process for cleaning wafers using the same18 Sep 2018US 10,077,365 B2Central Glass Company, Limited
- Semiconductor device, method for manufacturing the same, and rinsing liquid3 Oct 2017US 9,780,008 B2Mitsui Chemicals, Inc.
- Liquid chemical for forming water repellent protecting film, and process for cleaning wafers using the same24 May 2016US 9,349,582 B2Central Glass Company, Limited
- Method of stripping organic mask with reduced damage to low-K film26 May 2015US 9,040,430 B2Lam Research Corporation
- Method and composition for restoring dielectric properties of porous dielectric materials12 Jul 2011US 7,977,121 B2Air Products and Chemicals, Inc.
- Liquid Chemical for Forming Water Repellent Protecting Film, and Process for Cleaning Wafers Using the Same11 Aug 2016US 2016/0230016 A1Central Glass Company, Limited
- Semiconductor device, method for manufacturing the same, and rinsing liquid2 Jul 2015US 2015/0187670 A1Mitsui Chemicals, Inc.
- Method of stripping organic mask with reduced damage to low-k film1 Jan 2015US 2015/0004797 A1Lam Research Corporation
- Liquid Chemical for Forming Water Repellent Protecting Film, and Process for Cleaning Wafers Using the Same1 Nov 2012US 2012/0272999 A1Central Glass Company, Limited
- Method and composition for restoring dielectric properties of porous dielectric materials22 May 2008US 2008/0118995 A1Air Products and Chemicals, Inc.
Most cited
By later US patents
- Semiconductor device, method for manufacturing the same, and rinsing liquid3US 9,780,008 B2Mitsui Chemicals, Inc. · 2017
- Method for cleaning semiconductor substrate1US 7,503,982 B2Kanto Jangaku Kabushiki Kaisha · 2009
- Method of stripping organic mask with reduced damage to low-K film1US 9,040,430 B2Lam Research Corporation · 2015
- Liquid chemical for forming water repellent protecting film, and process for cleaning wafers using the same1US 9,349,582 B2Central Glass Company, Limited · 2016