H01J 37/32596
Hollow cathodes
Official title: {Hollow cathodes}
H01J37/32596 (Hollow cathodes) appears on 167 US grants and 167 published applications in this corpus.
Search patents in H01J- Granted patents
- 167
- Published applications
- 167
- Assignees
- 105
- Inventors
- 369
- Latest grant
- 2 Jun 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1982 | 1 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 1 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 1 | 0 |
| 1993 | 1 | 0 |
| 1994 | 1 | 0 |
| 1995 | 5 | 0 |
| 1996 | 0 | 0 |
| 1997 | 1 | 0 |
| 1998 | 2 | 0 |
| 1999 | 2 | 0 |
| 2000 | 5 | 0 |
| 2001 | 4 | 2 |
| 2002 | 4 | 0 |
| 2003 | 2 | 0 |
| 2004 | 3 | 2 |
| 2005 | 3 | 2 |
| 2006 | 0 | 1 |
| 2007 | 1 | 3 |
| 2008 | 1 | 5 |
| 2009 | 3 | 9 |
| 2010 | 3 | 7 |
| 2011 | 5 | 8 |
| 2012 | 2 | 10 |
| 2013 | 6 | 5 |
| 2014 | 7 | 7 |
| 2015 | 7 | 15 |
| 2016 | 10 | 16 |
| 2017 | 13 | 16 |
| 2018 | 12 | 12 |
| 2019 | 20 | 6 |
| 2020 | 12 | 7 |
| 2021 | 4 | 7 |
| 2022 | 2 | 7 |
| 2023 | 9 | 10 |
| 2024 | 7 | 4 |
| 2025 | 4 | 3 |
| 2026 | 3 | 3 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Method for coating metal2 Jun 2026US 12,644,177 B2Agc Glass Europe
- Plasma generating apparatus31 Mar 2026US 12,592,365 B2
- Hollow cathode system for generating a plasma and method for operating such a hollow cathode system17 Mar 2026US 12,580,161 B2Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e. V.
- Apparatus and method for coating the inner surface of a hollow article23 Dec 2025US 12,503,756 B2Plasmateria GmbH
- High current heaterless hollow cathode17 Jun 2025US 12,334,310 B2California Institute of Technology
- Plasma processing apparatus12 Mar 2026US 2026/0074159 A1
- Decoratively coated polymer substrates and process for obtaining the same12 Feb 2026US 2026/0043140 A1Agc Glass Europe
- Etching by electron enhanced processes with positive substrate voltage29 Jan 2026US 2026/0033260 A1Samsung Electronics Co., Ltd.
- Plasma processing apparatus2 Oct 2025US 2025/0308861 A1Beijing E-Town Semiconductor Technology Co., Ltd.
- Plasma processing apparatus3 Apr 2025US 2025/0112030 A1Beijing E-Town Semiconductor Technology Co., Ltd.
Most cited
By later US patents
- Plasma uniformity control by gas diffuser hole design746US 8,083,853 B2APPLIED Materials.Inc. · 2011
- Diffuser plate with slit valve compensation739US 8,328,939 B2APPLIED Materials.Inc. · 2012
- Plasma reactor for processing substrates comprising means for inducing electron cyclotron resonance (ECR) and ion cyclotron resonance (ICR) conditions248US 5,279,669 AInternational Business Machines Corporation · 1994
- Method and an apparatus for generation of a discharge in own vapors of a radio frequency electrode for sustained self-sputtering and evaporation of the electrode239US 5,716,500 ASurfcoat Oy · 1998
- Hollow cathode array and method of cleaning sheet stock therewith113US 5,627,435 AThe BOC Group, Inc. · 1997