Plasma processing apparatus

A processing system for processing a plurality of workpieces, comprising:

• a processing chamber;
• a workpiece support in the processing chamber configured to support a workpiece;
• a hollow cathode disposed in the processing chamber configured to produce a plasma in the processing chamber, wherein the hollow cathode is adjacent to a top of the processing chamber;
• a gas distribution system configured to provide process gas to the processing chamber;
• and a controller configured to operate one or more of the workpiece support, the hollow cathode, or the gas distribution system to implement a plasma treatment process.

A method for processing a workpiece in a plasma processing apparatus, the method comprising:

• placing the workpiece on a workpiece support disposed in a processing chamber of the plasma processing apparatus;
• performing a plasma treatment process on the workpiece in the processing chamber including:
• generating a plasma in the processing chamber using a hollow cathode between the workpiece support and a top of the processing chamber;
• and
• exposing the workpiece to the plasma.