H01J 37/32587
Triode systems
Official title: {Triode systems}
H01J37/32587 (Triode systems) appears on 46 US grants and 36 published applications in this corpus.
Search patents in H01J- Granted patents
- 46
- Published applications
- 36
- Assignees
- 30
- Inventors
- 105
- Latest grant
- 7 Apr 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1982 | 1 | 0 |
| 1983 | 0 | 0 |
| 1984 | 1 | 0 |
| 1985 | 0 | 0 |
| 1986 | 1 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 1 | 0 |
| 1991 | 1 | 0 |
| 1992 | 0 | 0 |
| 1993 | 1 | 0 |
| 1994 | 4 | 0 |
| 1995 | 3 | 0 |
| 1996 | 0 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 0 | 0 |
| 2000 | 2 | 0 |
| 2001 | 1 | 0 |
| 2002 | 4 | 2 |
| 2003 | 1 | 0 |
| 2004 | 0 | 1 |
| 2005 | 1 | 2 |
| 2006 | 0 | 0 |
| 2007 | 1 | 1 |
| 2008 | 0 | 3 |
| 2009 | 1 | 1 |
| 2010 | 3 | 2 |
| 2011 | 0 | 1 |
| 2012 | 2 | 4 |
| 2013 | 0 | 1 |
| 2014 | 2 | 0 |
| 2015 | 0 | 2 |
| 2016 | 1 | 0 |
| 2017 | 3 | 2 |
| 2018 | 1 | 3 |
| 2019 | 1 | 2 |
| 2020 | 0 | 1 |
| 2021 | 2 | 2 |
| 2022 | 2 | 3 |
| 2023 | 2 | 2 |
| 2024 | 1 | 0 |
| 2025 | 1 | 1 |
| 2026 | 1 | 0 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Vacuum layer deposition apparatus and method of depositing a layer on a substrate, especially on a substrate comprising indentations in the surface to be coated7 Apr 2026US 12,595,550 B2Evatec AG
- Plasma generator4 Mar 2025US 12,245,352 B2Ananda Shakti Technologies Ltd.
- Symmetric VHF source for a plasma reactor19 Mar 2024US 11,935,724 B2APPLIED Materials.Inc.
- Pulsed cathodic arc deposition26 Dec 2023US 11,851,746 B2Oerlikon Surface Solutions AG, PfäFfikon
- Symmetric VHF source for a plasma reactor21 Feb 2023US 11,587,766 B2APPLIED Materials.Inc.
- Vacuum layer deposition apparatus and method of depositing a layer on a substrate, especially on a substrate comprising indentations in the surface to be coated12 Jun 2025US 2025/0188594 A1Evatec AG
- Symmetric vhf source for a plasma reactor22 Jun 2023US 2023/0197406 A1APPLIED Materials.Inc.
- Plasma generator19 Jan 2023US 2023/0017324 A1Ananda Shakti Technologies Ltd.
- Ground path systems for providing a shorter and symmetrical ground path22 Dec 2022US 2022/0403520 A1APPLIED Materials.Inc.
- Apparatus and method for in-situ microwave anneal enhanced atomic layer deposition7 Jul 2022US 2022/0213598 A1Oregon State University
Most cited
By later US patents
- Multi-electrode plasma processing apparatus262US 5,464,499 ATexas Instruments Incorporated · 1995
- Plasma reactor for processing substrates comprising means for inducing electron cyclotron resonance (ECR) and ion cyclotron resonance (ICR) conditions248US 5,279,669 AInternational Business Machines Corporation · 1994
- Hollow-anode glow discharge apparatus222US 5,248,371 AGeneral Signal Corporation · 1993
- Plasma reactor apparatus and method198US 4,464,223 ATegal Corporation · 1984
- Vacuum processing apparatus95US 7,780,790 B2Canon Anelva Corporation · 2010