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US 11,935,724 B2Granted
Symmetric VHF source for a plasma reactor
AssigneeApplied Materials, Inc.
InventorsKartik Ramaswamy, Igor Markovsky, Zhigang Chen, James D. Carducci, Kenneth S. Collins, Shahid Rauf, Nipun Misra, Leonid Dorf, Zheng John Ye
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Abstract
The disclosure pertains to a capacitively coupled plasma source in which VHF power is applied through an impedance-matching coaxial resonator having a symmetrical power distribution.
Claims15
A plasma reactor comprising:
- a vacuum chamber enclosure with a center electrode and a dielectric ring surrounding the center electrode;
- a coaxial resonator comprising
- a conductively connected assembly that includes
- (a) a hollow inner conductive cylinder having a bottom edge contacting said center electrode,
- (b) a hollow outer conductive cylinder surrounding said hollow inner conductive cylinder and having a bottom edge contacting said dielectric ring, and
- (c) an annular conductor extending between and electrically contacting said hollow inner conductive cylinder and said hollow outer conductive cylinder, and
- a hollow center conductive cylinder located between said hollow inner conductive cylinder and said hollow outer conductive cylinder, and having a bottom edge contacting said center electrode, said hollow center conductive cylinder having a top edge facing and spaced from said annular conductor by an axial gap length;
- a power coupler including a first axial conductor electrically coupled to the hollow center conductive cylinder and a cylindrical second axial conductor surrounding the first axial conductor and electrically coupled to the hollow inner conductive cylinder;
- and
- a VHF power generator to supply power to the coaxial resonator.
7 more elements
Dependencies are inferred from the claim text.