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US 11,587,766 B2Granted
Symmetric VHF source for a plasma reactor
AssigneeApplied Materials, Inc.
InventorsKartik Ramaswamy, Igor Markovsky, Zhigang Chen, James D. Carducci, Kenneth S. Collins, Shahid Rauf, Nipun Misra, Leonid Dorf, Zheng John Ye
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Abstract
The disclosure pertains to a capacitively coupled plasma source in which VHF power is applied through an impedance-matching coaxial resonator having a symmetrical power distribution.
Claims15
A plasma reactor comprising:
- a vacuum chamber enclosure having a ceiling with an electrode;
- a coaxial resonator positioned above the vacuum chamber and coupled to the electrode, the coaxial resonator including
- a hollow center conductive cylinder;
- a cylindrical conductive shell including
- a hollow inner conductive cylinder coaxial with and surround by the hollow center conductive cylinder,
- a hollow outer conductive cylinder coaxial with and surrounding the hollow center conductive cylinder,
- an annular conductor plate extending radially extending between and electrically connecting respective top edges of the inner and outer conductive cylinder, wherein a top edge of the hollow center conductive cylinder is spaced from the annular conductor plate by an axial gap length;
- and
- a power coupler to connect the coaxial resonator to a VHF generator, the power coupler including one or more spoke conductors, each spoke conductor of the one or more spoke conductors including
- an inner conductor line that extends through an aperture in the cylindrical conductive shell to connect to the center conductive cylinder, and
- an outer conductor coaxially with and surrounding a portion of the inner conductor line outside cylindrical conductive shell, the outer conductor extending to and connected to cylindrical conductive shell.
8 more elements
Dependencies are inferred from the claim text.