Plasma reactor apparatus and method
AssigneeTegal Corporation
InventorGeorges J. Gorin
Life of this patent
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Abstract
An improved plasma reactor apparatus and method are disclosed. Improved uniformity of etching and etch rate are achieved in a reactor through the use of electrodes powered at high and low frequencies. In one embodiment of the invention the workpiece which is to be etched rests on an electrode powered at a low AC frequency of about 100 KHz. A second electrode is powered at a high AC frequency of about 13.56 MHz. A third electrode is maintained at ground potential. High and low frequency AC fields acting on a reactant material optimize the dissociation of the reactant material and the ion energy of the plasma generated reactant species.
Claims11
A reactor apparatus including a reaction volume into which reactants are injected and from which reaction products are exhausted, and in which said reactants are acted upon by electric fields to form a plasma thereof, said apparatus comprising:
- first, second, and third electrodes, said first electrode coupled to electrical ground, said second electrode selectively coupled to a high frequency source of AC power, and said third electrode selectively coupled to a low frequency source of AC power.
A plasma reactor apparatus comprising:
- first, second, and third electrodes;
- a first insulator electrically separating said first and second electrodes;
- a second insulator electrically separating said second and third electrodes;
- said electrodes and said insulators positioned to bound a reaction volume;
- means for admitting reactants to said reaction volume and for removing reaction products from said reaction volume;
- a first high frequency AC power supply selectively coupled to said second electrode;
- a second low frequency AC power supply selectively coupled to said third electrode;
- and an electrical ground coupled to said first electrode.
A method for etching a workpiece positioned in a plasma reactor apparatus which comprises the steps of:
- providing first, second, and third electrodes in said apparatus;
- injecting a reactant gas into said apparatus;
- and creating a reactant gas plasma by selectively applying a high frequency AC field between said first and second electrodes and a low frequency AC field between said first and third electrodes.
Dependencies are inferred from the claim text.