H01J 37/32376
Scanning across large workpieces
Official title: {Scanning across large workpieces}
H01J37/32376 (Scanning across large workpieces) appears on 34 US grants and 50 published applications in this corpus.
Search patents in H01J- Granted patents
- 34
- Published applications
- 50
- Assignees
- 36
- Inventors
- 112
- Latest grant
- 2 Jun 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1997 | 1 | 0 |
| 1998 | 0 | 0 |
| 1999 | 0 | 0 |
| 2000 | 0 | 0 |
| 2001 | 1 | 0 |
| 2002 | 0 | 3 |
| 2003 | 1 | 4 |
| 2004 | 1 | 4 |
| 2005 | 2 | 2 |
| 2006 | 2 | 1 |
| 2007 | 2 | 1 |
| 2008 | 1 | 3 |
| 2009 | 0 | 3 |
| 2010 | 1 | 1 |
| 2011 | 1 | 4 |
| 2012 | 0 | 5 |
| 2013 | 4 | 3 |
| 2014 | 2 | 2 |
| 2015 | 5 | 1 |
| 2016 | 2 | 3 |
| 2017 | 0 | 0 |
| 2018 | 1 | 3 |
| 2019 | 1 | 0 |
| 2020 | 3 | 4 |
| 2021 | 0 | 0 |
| 2022 | 0 | 0 |
| 2023 | 1 | 1 |
| 2024 | 1 | 2 |
| 2025 | 0 | 0 |
| 2026 | 1 | 0 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Integrated atmospheric plasma treatment station in processing tool2 Jun 2026US 12,648,418 B2Lam Research Corporation
- Scanned angled etching apparatus and techniques providing separate co-linear radicals and ions1 Oct 2024US 12,106,936 B2APPLIED Materials.Inc.
- Scanned angled etching apparatus and techniques providing separate co-linear radicals and ions1 Aug 2023US 11,715,621 B2APPLIED Materials.Inc.
- Techniques, system and apparatus for selective deposition of a layer using angled ions29 Dec 2020US 10,879,055 B2Varian Semiconductor Equipment Associates, Inc.
- Drop-on-demand identification document printing with surface pre-treatment13 Oct 2020US 10,800,194 B2Entrust Datacard Corporation
- Integrated atmospheric plasma treatment station in processing tool27 Jun 2024US 2024/0213089 A1Lam Research Corporation
- Surface modification method16 May 2024US 2024/0162018 A1Sekisui Chemical Co., Ltd.
- Scanned angled etching apparatus and techniques providing separate co-linear radicals and ions19 Oct 2023US 2023/0335375 A1APPLIED Materials.Inc.
- Scanned angled etching apparatus and techniques providing separate co-linear radicals and ions18 Jun 2020US 2020/0194226 A1APPLIED Materials.Inc.
- Drop-on-demand identification document printing with surface pre-treatment28 May 2020US 2020/0164672 A1Entrust Datacard Corporation
Most cited
By later US patents
- Localized plasma assisted chemical etching through a mask32US 5,688,415 AIPEC Precision, Inc. · 1997
- Apparatus and method for reactive atom plasma processing for material deposition21US 6,660,177 B2RAPT Industries, Inc. · 2003
- Method for treating articles with a plasma jet16US 6,238,587 B1Ipec Precison, Inc. · 2001
- Portable apparatus and method for treating a workpiece14US 6,821,379 B2The Procter & Gamble Company · 2004
- Apparatus and method for reactive atom plasma processing for material deposition13US 7,311,851 B2RAPT Industries, Inc. · 2007