H01J 2237/20257
Magnetic coupling
H01J2237/20257 (Magnetic coupling) appears on 7 US grants and 10 published applications in this corpus.
Search patents in H01J- Granted patents
- 7
- Published applications
- 10
- Assignees
- 12
- Inventors
- 25
- Latest grant
- 18 Aug 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1992 | 1 | 0 |
| 1993 | 0 | 0 |
| 1994 | 1 | 0 |
| 1995 | 0 | 0 |
| 1996 | 0 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 0 | 0 |
| 2000 | 0 | 0 |
| 2001 | 0 | 0 |
| 2002 | 0 | 0 |
| 2003 | 0 | 0 |
| 2004 | 0 | 0 |
| 2005 | 0 | 0 |
| 2006 | 0 | 0 |
| 2007 | 0 | 0 |
| 2008 | 0 | 0 |
| 2009 | 0 | 0 |
| 2010 | 0 | 1 |
| 2011 | 1 | 0 |
| 2012 | 0 | 1 |
| 2013 | 0 | 0 |
| 2014 | 1 | 0 |
| 2015 | 0 | 1 |
| 2016 | 0 | 0 |
| 2017 | 0 | 0 |
| 2018 | 0 | 0 |
| 2019 | 0 | 0 |
| 2020 | 0 | 2 |
| 2021 | 2 | 0 |
| 2022 | 0 | 0 |
| 2023 | 0 | 1 |
| 2024 | 0 | 2 |
| 2025 | 0 | 1 |
| 2026 | 1 | 1 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Stage device, charged particle beam apparatus, and vacuum apparatus18 Aug 2026US 12,712,145 B2Hitachi High-Tech Corporation
- Scanning electron microscope with objective lens below sample stage21 Sep 2021US 11,127,564 B2Kkt Holdings Syndicate
- Ion milling device11 May 2021US 11,004,652 B2Hitachi High-Tech Corporation
- Magnetic bearing, a rotary stage, and a reflective electron beam lithography apparatus16 Sep 2014US 8,836,190 B2Koninklijke Philips N. V.
- Moving module of a wafer ion-implanting machine7 Jun 2011US 7,956,333 B2Inotera Memories, Inc.
- Substrate processing apparatus for double-sided sputtering27 Aug 2026US 2026/0253851 A1Sea, Ltd.
- Stage Device and Charged Particle Beam Device Equipped with the Same20 Nov 2025US 2025/0357074 A1Hitachi High-Tech Corporation
- Magnetic rotation device for high vacuum applications such as ion and isotope production26 Dec 2024US 2024/0429019 A1SHINE Technologies, LLC
- Sample Holder and Sample Processing Apparatus3 Oct 2024US 2024/0331970 A1JEOL Ltd.
- Stage device, charged particle beam apparatus, and vacuum apparatus17 Aug 2023US 2023/0260740 A1Hitachi High-Tech Corporation
Most cited
By later US patents
- Device for positioning objects within a sealed chamber23US 5,139,383 AHuntington Mechanical Laboratories, Inc. · 1992
- Apparatus for ion implantation including contactless cooling and beam current measurement means7US 5,338,940 ANissin High Voltage Co., Ltd. · 1994
- Scanning electron microscope with objective lens below sample stage1US 11,127,564 B2Kkt Holdings Syndicate · 2021
- Magnetic bearing, a rotary stage, and a reflective electron beam lithography apparatus1US 8,836,190 B2Koninklijke Philips N. V. · 2014